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Properties of highly Cr-doped AlN

机译:高Cr掺杂AlN的性能

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Cr concentrations of ~2 at. % were incorporated into AlN during growth by molecular beam epitaxy. Under optimized conditions, single-phase, insulating AlCrN is produced whose band gap shows a small (0.1-0.2 eV) decrease from the value for undoped AlN (6.2 eV), a decrease in a-plane lattice constant and the introduction of two absorption bands at 3 and 5 eV into the band gap. This material shows ferromagnetism with a Curie temperature above 300 K as judged from the difference in field-cooled and zero-field-cooled magnetization. For nonoptimized growth, second phases of Cr_(2)N and Al_(x)Cr_(y) are produced in the AlN and the material is conducting (~1000 Ω cm) with activation energy for conduction of 0.19 eV and apparent band gap of 5.8 eV.
机译:Cr浓度为〜2 at。在生长期间,通过分子束外延将%的Al 2 O 3掺入AlN中。在最佳条件下,会产生单相绝缘AlCrN,其带隙显示出比未掺杂AlN的值(6.2 eV)小(0.1-0.2 eV)减小,a面晶格常数减小,并且引入了两种吸收3和5 eV的能带进入带隙。根据场冷和零场冷的磁化强度的差异判断,这种材料显示出居里温度高于300 K的铁磁性。对于非最佳生长,在AlN中会生成Cr_(2)N和Al_(x)Cr_(y)的第二相,并且该材料正在传导(〜1000Ωcm),其活化能为0.19 eV,表观带隙为5.8 eV。

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