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Organic light-emitting devices with in situ postgrowth annealed organic layers

机译:具有原位后生长退火有机层的有机发光器件

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摘要

A comparative study of in situ postgrowth annealing of organic layers before metal cathode was conducted on tris-(8-hydroxyqunoline) aluminum (Alq_3)-based organic light-emitting devices (OLEDs). The devices were fabricated in the same ran with a standard device without annealing for comparison, with an identical structure of indium tin oxide (ITO)/copper phthalocyanine (CuPc) (10 nm)/N,N′-di(naphthalene-1-yl)-N,N′-diphenyl-benzidine (NPB) (90 nm)/Alq_3 (90 nm)/ Mg:Ag (200 nm)/Ag (20 nm). The annealing temperature used was 60, 80, and 100℃, respectively. It was found that, in situ postgrowth annealing improves the device performance, and annealing near the glass transition temperature of NPB (99.7℃), improves device performance drastically. Power efficiency and current efficiency increase significantly with the annealing temperature, except the current efficiency for device annealed at 100℃ is slightly lower than that of the standard device. The voltage and current density for 100 cd/m~2 luminance are 5.6 V and 4.4 mA/cm~2, respectively, for the device annealed at 100℃, in comparison to 9.2 V and 4.3 mA/cm~2, respectively, for the standard device, the power efficiency is much improved by more than 40%. The in situ postgrowth annealed organic layers were characterized by photoluminescence and Raman spectroscopy.
机译:在基于三(8-羟基喹啉)铝(Alq_3)的有机发光器件(OLEDs)上进行有机阴极原位后生长退火的比较研究。器件在与标准器件相同的运行中制造,没有进行退火以进行比较,具有相同的铟锡氧化物(ITO)/铜酞菁(CuPc)(10 nm)/ N,N'-二(萘-1-) yl)-N,N'-二苯基联苯胺(NPB)(90 nm)/ Alq_3(90 nm)/ Mg:Ag(200 nm)/ Ag(20 nm)。使用的退火温度分别为60、80和100℃。结果发现,原位后生长退火可以改善器件性能,而在NPB的玻璃化转变温度(99.7℃)附近退火可以显着提高器件性能。功率效率和电流效率随退火温度的增加而显着增加,但在100℃退火的器件的电流效率略低于标准器件。 100 cd / m〜2亮度的电压和电流密度,在100℃退火后的器件分别为5.6 V和4.4 mA / cm〜2,相比之下,在100℃退火时的电压和电流密度分别为9.2 V和4.3 mA / cm〜2。与标准设备相比,电源效率大大提高了40%以上。原位生长后退火的有机层通过光致发光和拉曼光谱表征。

著录项

  • 来源
    《Applied Physics Letters》 |2005年第6期|p.063505.1-063505.3|共3页
  • 作者单位

    School of Electrical and Electronic Engineering, Nanyang Technological University, Nanyang Avenue, Singapore 639798, Singapore;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 应用物理学;
  • 关键词

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