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Light emission efficiency and dynamics in silicon-rich silicon nitride films

机译:富硅氮化硅膜的发光效率和动力学

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摘要

Light-emitting Si-rich silicon nitride (SRN) films were fabricated by plasma enhanced chemical vapor deposition followed by thermal annealing and the SRN external quantum efficiency was measured. The SRN light emission temperature dependence and recombination dynamics were also studied. Small emission thermal quenching from 4 to 330 K with wavelength dependent, nanosecond recombination lifetime was observed. Light emission from SRN systems can provide alternative routes towards the fabrication of efficient Si-based optical devices.
机译:通过等离子增强化学气相沉积,然后进行热退火来制造发光的富硅氮化硅(SRN)膜,并测量SRN的外部量子效率。还研究了SRN发光温度依赖性和重组动力学。观察到从4到330 K的小发射热猝灭,具有波长依赖性的纳秒复合寿命。从SRN系统发出的光可以为制造高效的基于Si的光学器件提供替代途径。

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