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Optical probing of a silicon integrated circuit using electric-field-induced second-harmonic generation

机译:利用电场感应二次谐波产生的硅集成电路的光学探测

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摘要

By using the electric-field-induced second-harmonic generation effect, we have detected electrical signals present on a complementary metal-oxide-semiconductor (CMOS) integrated circuit in a noncontact geometry. Femtosecond pulses with a wavelength of 2.16 μm were incident on the device and the second harmonic at 1.08 μm exhibited a field-dependent behavior. The conversion efficiency from the fundamental to the second harmonic was estimated to be -103 dB.
机译:通过使用电场感应的二次谐波产生效应,我们已经检测到以互补形式存在于互补金属氧化物半导体(CMOS)集成电路上的电信号。波长为2.16μm的飞秒脉冲入射到设备上,1.08μm的二次谐波表现出与场有关的行为。从基波到二次谐波的转换效率估计为-103 dB。

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