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Lattice parameter and hole density of (Ga,Mn)As on GaAs(311)A

机译:GaAs(311)A上(Ga,Mn)As的晶格参数和空穴密度

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摘要

We discuss the structural and electrical properties of (Ga,Mn)As layers with Mn concentrations up to 5%, grown on GaAs(311)A substrates by low-temperature molecular-beam epitaxy. High-resolution x-ray diffraction studies reveal a higher concentration of As antisites and a weaker linear increase of the relaxed lattice constant with Mn content in the (311)A layers compared to (100) reference layers. The hole densities and Curie temperatures, determined from magnetotransport measurements, are drastically reduced in the (311)A layers. The findings are explained by an enhanced incorporation of Mn atoms on nonsubstitutional and noninterstitial sites, probably as Mn-Mn or As-Mn complexes, caused by the larger amount of excess As in the (311)A layers.
机译:我们讨论了通过低温分子束外延在GaAs(311)A衬底上生长的Mn浓度高达5%的(Ga,Mn)As层的结构和电学性质。高分辨率x射线衍射研究显示,与(100)参考层相比,(311)A层中较高浓度的As反位点和弛豫晶格常数随Mn含量的线性增加较弱。由磁传输测量确定的空穴密度和居里温度在(311)A层中大大降低。这些发现是由于(311)A层中大量过量的As导致Mn原子在非取代和非填隙位点上的掺入增加,可能是Mn-Mn或As-Mn络合物。

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