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Direct evidence for abrupt postcrystallization germanium precipitation in thin phase-change films of Sb-15 at. % Ge

机译:在Sb-15 at的相变薄膜中突然出现的后结晶锗沉淀的直接证据。锗

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We present evidence for the instability in the crystalline (metallic) state of binary Te-free phase-change Ge-Sb thin films considered for integration into nonvolatile nanosized memory cells. We find that while the amorphous (semiconducting) phase of eutectic Sb-15 at. % Ge is very robust until Sb crystallization at 240 ℃, at about 350 ℃, germanium rapidly precipitates out. Ge precipitation, visualized directly with transmission electron microscopy, is exothermic and is found to affect the films' reflectivity, resistance, and stress. It converts melting into a two-step process, which may seriously impact the switching reliability of a device.
机译:我们目前的证据表明,二元无Te相变Ge-Sb薄膜的晶体(金属)态的不稳定性考虑用于集成到非易失性纳米尺寸存储单元中。我们发现,当共晶Sb-15处于非晶(半导体)相时。直到240℃下Sb结晶,大约350℃,锗才非常坚固,锗会迅速析出。用透射电子显微镜直接观察到的锗沉淀是放热的,并且发现影响膜的反射率,电阻和应力。它将熔化转换为两步过程,这可能会严重影响器件的开关可靠性。

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