Nickel self-diffusion in silicon-rich Si-Ni melts

摘要

The nickel self-diffusion coefficient in Si-Ni melts was measured for compositions up to 20 at. % Ni in a temperature range from 270 K below to 200 K above the liquidus temperature by using quasielastic neutron scattering in combination with electromagnetic levitation. Ni self-diffusion coefficients are in the order of 10~(-8) m~2/s, fairly independent of the Ni concentration. Diffusion coefficients calculated from viscosity data of pure liquid silicon via the Stokes-Einstein relation compare well with the Ni self-diffusion obtained here, indicating a strong correlation between the mobility of the silicon and nickel atoms.