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首页> 外文期刊>Applied Physics Letters >Microstructure and recording mechanism of Bi-Fe-(N) layer for highdensity write-once optical disk
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Microstructure and recording mechanism of Bi-Fe-(N) layer for highdensity write-once optical disk

机译:高密度一次写入光盘的Bi-Fe-(N)层的微观结构和记录机理

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摘要

Bi-Fe-(N) thin film as the recording layer of high density digital versatile disk recordable optical disk was developed. For the disk sample with optimized layer structure, maximum partial response signal to noise ratio of 21.1 and minimum simulated bit error rate of 5×10~(-7) were achieved at the write power=5.7 mW. Transmission electron microscopy characterization illustrated that the separation of Bi and Fe elements to form the coarse granular structure in the mark regime during laser irradiation comprised of the recording mechanism.
机译:开发了作为高密度数字通用光盘可记录光盘记录层的Bi-Fe-(N)薄膜。对于具有优化层结构的磁盘样本,在写入功率= 5.7 mW时,实现了最大的部分响应信噪比为21.1,并且最小的模拟误码率为5×10〜(-7)。透射电子显微镜表征表明,在包括记录机理的激光辐照过程中,Bi和Fe元素的分离形成了标记状态下的粗粒结构。

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