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首页> 外文期刊>Applied Physicsletters >Reduction in high reset currents in unipolar resistance switching Pt/SrTiO_x/Pt capacitors using acceptor doping
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Reduction in high reset currents in unipolar resistance switching Pt/SrTiO_x/Pt capacitors using acceptor doping

机译:使用受体掺杂降低单极电阻开关Pt / SrTiO_x / Pt电容器中的高复位电流

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摘要

The high reset current, I_R, in unipolar resistance switching is an important issue which should be resolved for practical applications in nonvolatile memories. We showed that, during the forming and set processes, the compliance current, I_(comp), can work as a crucial parameter to reduce I_R. Doping with Co or Mn can significantly reduce the leakage current in capacitors made using SrTiO_x film, opening a larger operation window for I_(comp). By decreasing I_(comp) with acceptor doping, we could reduce I_R in SrTiO_x films by a factor of approximately 20. Our work suggests that the decrease in I_(comp) by carrier doping could be a viable alternative for reducing I_R in unipolar resistance switching.
机译:单极电阻切换中的高复位电流I_R是一个重要问题,对于非易失性存储器中的实际应用应解决。我们表明,在成型和设置过程中,柔顺电流I_(comp)可以作为降低I_R的关键参数。掺杂Co或Mn可以显着降低使用SrTiO_x膜制成的电容器的漏电流,从而为I_(comp)开辟了更大的工作窗口。通过用受体掺杂降低I_(comp),我们可以将SrTiO_x薄膜中的I_R降低约20倍。我们的工作表明,通过载流子掺杂降低I_(comp)可能是降低单极电阻切换I_R的可行选择。 。

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  • 来源
    《Applied Physicsletters》 |2010年第9期|P.093505.1-093505.3|共3页
  • 作者单位

    ReCFI, Department of Physics and Astronomy, Seoul National University, Seoul 151-747, Republic of Korea;

    rnReCFI, Department of Physics and Astronomy, Seoul National University, Seoul 151-747, Republic of Korea;

    rnDepartment of Physics and Astronomy, Seoul National University, Seoul 151-747, Republic of Korea;

    rnReCFI, Department of Physics and Astronomy, Seoul National University, Seoul 151-747, Republic of Korea;

    rnReCFI, Department of Physics and Astronomy, Seoul National University, Seoul 151-747, Republic of Korea;

    rnReCFI, Department of Physics and Astronomy, Seoul National University, Seoul 151-747, Republic of Korea;

    rnDepartment of Physics and Astronomy, Seoul National University, Seoul 151-747, Republic of Korea;

    Samsung Advanced Institute of Technology, Yongin, Gyeonggi-do 446-712, Republic of Korea;

    rnSamsung Advanced Institute of Technology, Yongin, Gyeonggi-do 446-712, Republic of Korea;

    Department of Applied Physics, Hanyang University, Ansan, Gyeonggi-do 426-791, Republic of Korea;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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