机译:真空紫外线和紫外线辐射对低k多孔有机硅酸盐电介质电容电压特性的影响
Department of Electrical and Computer Engineering and Plasma Processing and Technology Laboratory,University of Wisconsin-Madison, Madison, Wisconsin 53706, USA;
Department of Electrical and Computer Engineering and Plasma Processing and Technology Laboratory,University of Wisconsin-Madison, Madison, Wisconsin 53706, USA;
Department of Electrical and Computer Engineering and Plasma Processing and Technology Laboratory,University of Wisconsin-Madison, Madison, Wisconsin 53706, USA;
Novellus Systems, Tualatin, Oregon 97062, USA;
Stanford University, Stanford, California 94305, USA;
Department of Electrical and Computer Engineering and Plasma Processing and Technology Laboratory,University of Wisconsin-Madison, Madison, Wisconsin 53706, USA;
机译:真空紫外线和紫外线辐射对低k多孔有机硅酸盐电介质电容电压特性的影响
机译:真空紫外线辐射对有机硅电介质随时间的介电击穿的影响
机译:真空紫外辐射对低k有机硅酸盐电介质介电常数的影响
机译:真空紫外辐射对低k多孔有机硅玻璃的损害
机译:真空紫外辐射对低k有机硅介电材料的破坏和铜迁移。
机译:紫外线照射的罗非鱼鱼皮明胶的功能特性
机译:电子自旋共振测量真空紫外辐射对低k有机硅玻璃(SiCOH)缺陷的影响
机译:用于中等和真空紫外线的光谱选择性光电探测器,以及用于真空紫外线的光电离室的特征