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Temperature-dependence of ink transport during thermal dip-pen nanolithography

机译:热浸笔式纳米光刻过程中墨水传输的温度依赖性

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摘要

We investigate the control of tip temperature on feature size during dip-pen nanolithography (DPN) of mercaptohexadecanoic acid (MHA) on Au. Heated atomic force microscopy (AFM) probes operated between 25 ℃ and 50 ℃ wrote nanostructures of MHA for various dwell times and tip speeds. The feature size exhibited an exponential dependence on tip temperature with an apparent activation barrier of 165kJ/mol. Analysis of the ink transfer process shows that, while ~1/3 of the barrier is from ink dissolution into the meniscus, the rest reflects the barrier to adsorption onto the growing feature, a process that has been ignored in previous DPN models.
机译:我们研究了巯基十六烷酸(MHA)在金上的浸笔式纳米光刻(DPN)过程中尖端温度对特征尺寸的控制。在25℃至50℃之间运行的加热原子力显微镜(AFM)探针记录了不同停留时间和尖端速度下MHA的纳米结构。特征尺寸表现出对尖端温度的指数依赖性,表观激活势垒为165kJ / mol。对墨水转移过程的分析表明,尽管约1/3的阻挡层是由于墨水溶解到弯液面中,但其余部分反映了吸收到增长特征上的阻挡层,这一过程在以前的DPN模型中已被忽略。

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  • 来源
    《Applied Physics Letters》 |2011年第19期|p.193101.1-193101.3|共3页
  • 作者单位

    Physical Biosciences Division, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA,Molecular Foundry, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA;

    Department of Mechanical Science and Engineering, University of Illinois Urbana-Champaign, Urbana,Illinois 61801, USA;

    Molecular Foundry, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA,Materials Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA;

    Department of Mechanical Science and Engineering, University of Illinois Urbana-Champaign, Urbana,Illinois 61801, USA;

    Molecular Foundry, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA,Materials Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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  • 入库时间 2022-08-18 03:18:15

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