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Effects of hydrostatic pressure on the electrical properties of hexagonal Ge_2Sb_2Te_5: Experimental and theoretical approaches

机译:静水压力对六角形Ge_2Sb_2Te_5电学性能的影响:实验和理论方法

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摘要

A combination of experiments and first-principles method calculations has been applied to investigate the influence of the hydrostatic pressure on the electrical properties of the phase-change material hexagonal Ge_2Sb_2Te_5 (h-GST). Experimentally, it is found that the resistance of h-GST declines monotonically with increasing hydrostatic pressure up to 0.7 GPa. Theoretically, the band-structure calculations revealed that the electronic band gap also decreases with the pressure. The hydrostatic pressure increases the conductivity of h-GST by reducing the electronic band gap. The dE_g/dP obtained from theoretical calculations and the d ln p/dP by experimental result are in the same order of magnitude.
机译:结合实验和第一性原理方法计算,研究了静水压力对相变材料六角形Ge_2Sb_2Te_5(h-GST)电学性能的影响。通过实验发现,h-GST的电阻随着静水压力的增加而单调下降,直到0.7 GPa。从理论上讲,能带结构计算表明,电子带隙也随压力而减小。静水压力通过减小电子带隙来增加h-GST的电导率。理论计算得到的dE_g / dP和实验结果得到的d ln p / dP处于相同的数量级。

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  • 来源
    《Applied Physics Letters》 |2011年第14期|p.142112.1-142112.3|共3页
  • 作者单位

    Department of Materials Science and Engineering, National Laboratory of Solid State Microstructures,Nanjing University, Nanjing 210093, People's Republic of China;

    Department of Materials Science and Engineering, National Laboratory of Solid State Microstructures,Nanjing University, Nanjing 210093, People's Republic of China;

    Department of Materials Science and Engineering, National Laboratory of Solid State Microstructures,Nanjing University, Nanjing 210093, People's Republic of China;

    Electronic Materials Research Laboratory, Key Laboratory of the Ministry of Education,Xi'an Jiaotong University, Xi'an 710046, People's Republic of China;

    Department of Materials Science and Engineering, National Laboratory of Solid State Microstructures,Nanjing University, Nanjing 210093, People's Republic of China;

    Department of Materials Science and Engineering, National Laboratory of Solid State Microstructures,Nanjing University, Nanjing 210093, People's Republic of China;

    Electronic Materials Research Laboratory, Key Laboratory of the Ministry of Education,Xi'an Jiaotong University, Xi'an 710046, People's Republic of China;

    Thin Film/Adv. Module/Technology R&D, Semiconductor Manufacturing International Corp.,Zhangjiang Road 18, Pudong New Area, Shanghai 201203, People's Republic of China,State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information technology, Chinese Academy of Sciences, Shanghai 200050, People's Republic of China;

    Thin Film/Adv. Module/Technology R&D, Semiconductor Manufacturing International Corp.,Zhangjiang Road 18, Pudong New Area, Shanghai 201203, People's Republic of China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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  • 入库时间 2022-08-18 03:17:52

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