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Visible to vacuum ultraviolet dielectric functions of epitaxial graphene on 3C and 4H SiC polytypes determined by spectroscopic ellipsometry

机译:通过椭圆偏振光谱法确定外延石墨烯在3C和4H SiC多型上的真空紫外介电功能

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摘要

Spectroscopic ellipsometry measurements in the visible to vacuum-ultraviolet spectra (3.5-9.5 eV) are performed to determine the dielectric function of epitaxial graphene on SiC polytypes, including 4H (C-face and Si-face) and 3C SiC (Si-face). The model dielectric function of graphene is composed of two harmonic oscillators and allows the determination of graphene quality, morphology, and strain. A characteristic van Hove singularity at 4.5 eV is present in the dielectric function of all samples, in agreement with observations on exfoliated as well as chemical vapor deposited graphene in the visible range. Model dielectric function analysis suggests that none of our graphene layers experience a significant degree of strain. Graphene grown on the Si-face of 4H SiC exhibits a dielectric function most similar to theoretical predictions for graphene. The carbon buffer layer common for graphene on Si-faces is found to increase polarizability of graphene in the investigated spectrum.
机译:进行可见光到真空紫外光谱(3.5-9.5 eV)的椭圆偏振光谱测量,以确定外延石墨烯在SiC多晶型上的介电功能,包括4H(C面和Si面)和3C SiC(Si面) 。石墨烯的模型介电函数由两个谐波振荡器组成,可以确定石墨烯的质量,形态和应变。在所有样品的介电功能中,在4.5 eV处都存在典型的范霍夫奇异性,这与在可见光范围内观察到的剥落石墨和化学气相沉积石墨烯的观察结果一致。模型介电功能分析表明,我们的石墨烯层均未经历明显的应变。在4H SiC的Si面上生长的石墨烯具有与石墨烯的理论预测最相似的介电功能。在研究的光谱中,发现Si面上石墨烯共有的碳缓冲层可提高石墨烯的极化率。

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  • 来源
    《Applied Physics Letters》 |2012年第1期|p.011912.1-011912.4|共4页
  • 作者单位

    Department of Electrical Engineering and Nebraska Center for Materials and Nanoscience,University of Nebraska-Lincoln, Lincoln, Nebraska 68588-0511, USA;

    Department of Electrical Engineering and Nebraska Center for Materials and Nanoscience,University of Nebraska-Lincoln, Lincoln, Nebraska 68588-0511, USA;

    Department of Physics, Chemistry, and Biology (IFM), Linkoping University, SE 581 83 Linkoping, Sweden;

    Department of Physics, Chemistry, and Biology (IFM), Linkoping University, SE 581 83 Linkoping, Sweden;

    Department of Electrical Engineering and Nebraska Center for Materials and Nanoscience,University of Nebraska-Lincoln, Lincoln, Nebraska 68588-0511, USA;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

  • 入库时间 2022-08-18 03:17:29

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