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Effective work functions for the evaporated metal/organic semiconductor contacts from in-situ diode flatband potential measurements

机译:通过原位二极管平带电势测量获得有效的功函数,用于蒸发的金属/有机半导体触点

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摘要

The diode built-in potentials (V_bi) of several polymer organic semiconductor (OSC) thin films [(2,5-dialkoxy-substituted poly(p-phenylenevinylene), poly(9,9-dialkylfluorene), poly(9,9-dialkylfluorene-a/f-phenylene(iV-phenyl)iminophenylene), and poly(9,9-dialkylfluorene-a/f-benzothiadiazole)] sandwiched between p-doped poly(3,4-ethylenedioxythiophene) (PEDT:PSSH) and evaporated metal contacts have been measured by bias-dependent electromodulated absorption (EA) spectroscopy of the Stark-shifted π-π~* band. From these values and the vacuum-level offsets at the PEDT:PSSH contacts evaluated by sub-gap EA spectroscopy, the following effective work functions for the buried evaporated metal contacts have been obtained: Al 3.4 ± 0.1, Ag 3.7 ± 0.1, Au 4.4 ± 0.1, and Ca 2.4 ± 0.1 eV. These work functions are smaller than those of the "clean" metal surfaces by up to 0.8 eV, and are substantially independent of the OSC in the absence of charge transfer.
机译:几种聚合物有机半导体(OSC)薄膜[(2,5-二烷氧基取代的聚对苯撑亚乙烯基),聚(9,9-二烷基芴),聚(9,9-夹在p掺杂的聚(3,4-乙撑二氧噻吩)(PEDT:PSSH)和蒸发金属接触已通过Stark位移π-π〜*谱带的偏压依赖性电调制吸收(EA)光谱进行了测量,并根据亚间隙EA光谱评估了这些值和PEDT:PSSH接触处的真空水平偏移,对于埋藏的蒸发金属触点,获得了以下有效功函数:Al 3.4±0.1,Ag 3.7±0.1,Au 4.4±0.1和Ca 2.4±0.1 eV。这些功函数小于“干净”的功函数。金属表面高达0.8 eV,并且在没有电荷转移的情况下基本独立于OSC。

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  • 来源
    《Applied Physics Letters》 |2012年第1期|p.013501.1-013501.4|共4页
  • 作者单位

    Department of Physics, National University of Singapore, Lower Kent Ridge Road, Singapore S117542;

    Department of Physics, National University of Singapore, Lower Kent Ridge Road, Singapore S117542;

    Cavendish Laboratory, University of Cambridge, JJ Thomson Road, Cambridge CB3 OHE, United Kingdom;

    Department of Physics, National University of Singapore, Lower Kent Ridge Road, Singapore S117542;

    Department of Chemistry, National University of Singapore, Lower Kent Ridge Road, Singapore SI 17543;

    Department of Physics, National University of Singapore, Lower Kent Ridge Road, Singapore S117542 Cavendish Laboratory, University of Cambridge, JJ Thomson Road, Cambridge CB3 OHE, United Kingdom,Department of Chemistry, National University of Singapore, Lower Kent Ridge Road, Singapore SI 17543;

    Department of Physics, National University of Singapore, Lower Kent Ridge Road, Singapore S117542,Cavendish Laboratory, University of Cambridge, JJ Thomson Road, Cambridge CB3 OHE, United Kingdom;

    Department of Physics, National University of Singapore, Lower Kent Ridge Road, Singapore S117542;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
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  • 入库时间 2022-08-18 03:17:29

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