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Proximity-coupled Ti/TiN multilayers for use in kinetic inductance detectors

机译:用于动感检测器的邻近耦合Ti / TiN多层

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摘要

We apply the superconducting proximity effect in TiN/Ti multi-layer films to tune the critical temperature, T_c, to within 10 mK with high uniformity (less than 15 mK spread) across a 75 mm wafer. Reproducible T_C's are obtained from 0.8 to 2.5 K. These films had high resistivities, >100μΩm, and internal quality factors for resonators in the GHz range, on the order of 100 k and higher. Trilayers of both TiN/Ti/TiN and thicker superlattice films were prepared, demonstrating a well controlled process for films over a wide thickness range. Detectors were fabricated and shown to have single photon resolution at 1550nm. The high uniformity and controllability coupled with the high quality factor, kinetic inductance, and inertness of TiN make these films ideal for use in frequency multiplexed kinetic inductance detectors and potentially other applications such as nanowire detectors, transition edge sensors, and associated quantum information applications.
机译:我们在TiN / Ti多层膜中应用超导邻近效应,以将临界温度T_c调整到10 mK以内,并在整个75 mm晶片上具有很高的均匀性(小于15 mK的分布)。可得到的T_C在0.8至2.5 K之间。这些薄膜的电阻率高,>100μΩm,并且在GHz范围内谐振器的内部品质因数约为100 k或更高。制备了TiN / Ti / TiN和较厚的超晶格薄膜的三层膜,这说明了在较宽的厚度范围内对薄膜进行良好控制的过程。探测器被制造出来并显示在1550nm处具有单光子分辨率。 TiN的高均匀性和可控性,再加上高品质因数,动电感和惰性,使得这些膜非常适合用于频率多路复用动电感检测器以及潜在的其他应用,例如纳米线检测器,过渡边缘传感器以及相关的量子信息应用。

著录项

  • 来源
    《Applied Physics Letters》 |2013年第23期|232603.1-232603.4|共4页
  • 作者单位

    National Institute of Standards and Technology, 325 Broadway, Boulder, Colorado 80305, USA;

    National Institute of Standards and Technology, 325 Broadway, Boulder, Colorado 80305, USA;

    National Institute of Standards and Technology, 325 Broadway, Boulder, Colorado 80305, USA;

    National Institute of Standards and Technology, 325 Broadway, Boulder, Colorado 80305, USA;

    Department of Physics, Saint Louis University, 3450 Linden Blvd., Saint Louis, Missouri 63103, USA;

    National Institute of Standards and Technology, 325 Broadway, Boulder, Colorado 80305, USA;

    National Institute of Standards and Technology, 325 Broadway, Boulder, Colorado 80305, USA;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
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  • 入库时间 2022-08-18 03:16:31

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