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Tuning of silicene-substrate interactions with potassium adsorption

机译:硅与底物相互作用与钾吸附的调节

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摘要

The evolution of the electronic structure and the structural stability of epitaxial silicene on ZrB_2(0001) thin films exposed to K atoms has been studied by angle-resolved photoelectron spectroscopy and low-energy electron diffraction. Potassium adsorption leads to charge donation to the silicene lattice, which is accompanied by the partial filling of a formerly unoccupied π* band and by the increasing hybridization between the diboride surface state and the lower branch of the back-folded π band. The results allow an identification of silicene-derived π electronic states and confirm that before K adsorption, the interactions at the silicene-substrate interface are rather weak.
机译:通过角分辨光电子能谱和低能电子衍射研究了在暴露于K原子的ZrB_2(0001)薄膜上电子结构的演化和外延硅的结构稳定性。钾的吸附导致将电荷捐赠给硅晶格,伴随着以前未占据的π*带的部分填充,以及二硼化物表面态与反折叠π带的下部分支之间的杂交增加。结果允许鉴定硅衍生的π电子态,并证实在K吸附之前,硅-底物界面处的相互作用相当弱。

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  • 来源
    《Applied Physics Letters》 |2013年第22期|221603.1-221603.4|共4页
  • 作者单位

    School of Materials Science, Japan Advanced Institute of Science and Technology (JAIST), 1-1 Asahidai, Nomi, Ishikawa 923-1292, Japan;

    School of Materials Science, Japan Advanced Institute of Science and Technology (JAIST), 1-1 Asahidai, Nomi, Ishikawa 923-1292, Japan;

    Center for Functional Nanomaterials, Brookhaven National Laboratory, Upton, New York 11973, USA;

    School of Materials Science, Japan Advanced Institute of Science and Technology (JAIST), 1-1 Asahidai, Nomi, Ishikawa 923-1292, Japan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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