首页> 外文期刊>Applied Physics Letters >Protection of MoO_3 high work function by organic thin film
【24h】

Protection of MoO_3 high work function by organic thin film

机译:有机薄膜对MoO_3高功函数的保护

获取原文
获取原文并翻译 | 示例
       

摘要

The effects of air exposure are investigated for molybdenum trioxide (MoO_3) covered with organic thin films using ultraviolet photoemission spectroscopy. It is found that the severe drop of the work function of MoO_3 by air exposure is substantially reduced by the organic thin films. Both CuPc and C_(60) are used for the investigations. The results indicate that the MoO_3 surface can be passivated by approximately two monolayers of organic thin films against exposure to air.
机译:使用紫外光发射光谱法研究了暴露于有机薄膜覆盖的三氧化钼(MoO_3)暴露在空气中的影响。发现有机薄膜大大减少了由于暴露于空气而引起的MoO_3的功函数的严重下降。 CuPc和C_(60)均用于研究。结果表明,MoO_3表面可以被大约两个单层有机薄膜钝化,以防止暴露于空气中。

著录项

  • 来源
    《Applied Physics Letters》 |2014年第18期|181602.1-181602.4|共4页
  • 作者单位

    Department of Physics and Astronomy, University of Rochester, Rochester, New York 14627, USA;

    Department of Physics and Astronomy, University of Rochester, Rochester, New York 14627, USA;

    Department of Physics and Astronomy, University of Rochester, Rochester, New York 14627, USA,Institute for Super-microstructure and Ultrafast Process in Advanced Materials (ISUPAM), Central South University, Changsha, Hunan 410083, People's Republic of China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

  • 入库时间 2022-08-18 03:16:05

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号