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Correlation of shape changes of grain surfaces and reversible stress evolution during interruptions of polycrystalline film growth

机译:多晶膜生长中断期间晶粒表面形状变化与可逆应力演变的相关性

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摘要

Short interruptions of the growth of polycrystalline films often lead to stress evolution that is reversed when growth is resumed. Correlated in situ stress measurements and ex situ transmission electron microscopy and atomic force microscopy characterizations of grain boundary surface grooves as a function of the interruption time are reported for films deposited at different temperatures and held for different times before quenching to room temperature. These studies suggest that during film deposition surface grooves at grain boundaries are kinetically constrained to be shallow, while during a growth interruption surface diffusion allows grain boundary grooves to deepen and approach their equilibrium depth. The latter relieves a component of the compressive stress associated with trapped atoms in the grain boundaries. When growth is resumed, the non-equilibrium surface morphology is reestablished and the compressive stress increases to its pre-interruption value.
机译:多晶膜生长的短暂中断通常会导致应力演化,恢复生长后应力会逆转。据报道,在不同温度下沉积并保持不同时间的薄膜在淬火至室温之前,相关的原位应力测量以及异质透射电子显微镜和原子力显微镜表征随中断时间而变化。这些研究表明,在膜沉积过程中,晶界处的表面沟槽在动力学上被约束为较浅,而在生长中断期间,表面扩散使晶界沟槽得以加深并接近其平衡深度。后者减轻了与在晶界中捕获的原子相关的压缩应力的一部分。恢复生长后,将重新建立非平衡表面形态,并且压应力会增加到其破裂前的值。

著录项

  • 来源
    《Applied Physics Letters》 |2014年第14期|141913.1-141913.4|共4页
  • 作者

    Hang Z. Yu; Carl V. Thompson;

  • 作者单位

    Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, USA;

    Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, USA;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

  • 入库时间 2022-08-18 03:15:49

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