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22.5% efficient silicon heterojunction solar cell with molybdenum oxide hole collector

机译:具有氧化钼空穴收集器的22.5%高效硅异质结太阳能电池

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摘要

Substituting the doped amorphous silicon films at the front of silicon heterojunction solar cells with wide-bandgap transition metal oxides can mitigate parasitic light absorption losses. This was recently proven by replacing p-type amorphous silicon with molybdenum oxide films. In this article, we evidence that annealing above 130 ℃-often needed for the curing of printed metal contacts-detrimentally impacts hole collection of such devices. We circumvent this issue by using electrodeposited copper front metallization and demonstrate a silicon heterojunction solar cell with molybdenum oxide hole collector, featuring a fill factor value higher than 80% and certified energy conversion efficiency of 22.5%.
机译:用宽带隙过渡金属氧化物代替硅异质结太阳能电池前端的掺杂非晶硅膜可以减轻寄生光吸收损失。最近通过用氧化钼膜代替p型非晶硅得到了证明。在本文中,我们证明了在130℃以上进行退火-这通常是印刷金属触点固化所必需的-不利地影响了此类器件的空穴收集。我们通过使用电沉积的铜正面金属化技术来解决此问题,并演示了具有氧化钼空穴收集器的硅异质结太阳能电池,其填充因子值高于80%,并且经过认证的能量转换效率为22.5%。

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  • 来源
    《Applied Physics Letters》 |2015年第8期|081601.1-081601.5|共5页
  • 作者单位

    Photovoltaics and Thin Film Electronics Laboratory, Institute of Microengineering (IMT), Ecole Polytechnique Federate de Lausanne (EPFL), Rue de la Maladiere 71b, CH-2000 Neuchatel, Switzerland;

    Photovoltaics and Thin Film Electronics Laboratory, Institute of Microengineering (IMT), Ecole Polytechnique Federate de Lausanne (EPFL), Rue de la Maladiere 71b, CH-2000 Neuchatel, Switzerland;

    Photovoltaics and Thin Film Electronics Laboratory, Institute of Microengineering (IMT), Ecole Polytechnique Federate de Lausanne (EPFL), Rue de la Maladiere 71b, CH-2000 Neuchatel, Switzerland;

    CSEM PV-Center, Jaquet-Droz 1, CH-2000 Neuchatel, Switzerland;

    Photovoltaics and Thin Film Electronics Laboratory, Institute of Microengineering (IMT), Ecole Polytechnique Federate de Lausanne (EPFL), Rue de la Maladiere 71b, CH-2000 Neuchatel, Switzerland;

    CSEM PV-Center, Jaquet-Droz 1, CH-2000 Neuchatel, Switzerland;

    CSEM PV-Center, Jaquet-Droz 1, CH-2000 Neuchatel, Switzerland;

    Photovoltaics and Thin Film Electronics Laboratory, Institute of Microengineering (IMT), Ecole Polytechnique Federate de Lausanne (EPFL), Rue de la Maladiere 71b, CH-2000 Neuchatel, Switzerland;

    Photovoltaics and Thin Film Electronics Laboratory, Institute of Microengineering (IMT), Ecole Polytechnique Federate de Lausanne (EPFL), Rue de la Maladiere 71b, CH-2000 Neuchatel, Switzerland;

    Photovoltaics and Thin Film Electronics Laboratory, Institute of Microengineering (IMT), Ecole Polytechnique Federate de Lausanne (EPFL), Rue de la Maladiere 71b, CH-2000 Neuchatel, Switzerland;

    Photovoltaics and Thin Film Electronics Laboratory, Institute of Microengineering (IMT), Ecole Polytechnique Federate de Lausanne (EPFL), Rue de la Maladiere 71b, CH-2000 Neuchatel, Switzerland,CSEM PV-Center, Jaquet-Droz 1, CH-2000 Neuchatel, Switzerland;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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  • 入库时间 2022-08-18 03:15:20

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