Publisher's Note: 'Formation of a strontium buffer layer on Si(001) by pulsed-laser deposition through the Sr/Si(001)(2×3) surface reconstruction'[Appl. Phys. Lett. 106, 071602 (2015)]

D. Klement; M. Spreitzer; D. Suvorov

首页> 外文期刊>Applied Physics Letters >Publisher's Note: 'Formation of a strontium buffer layer on Si(001) by pulsed-laser deposition through the Sr/Si(001)(2×3) surface reconstruction'[Appl. Phys. Lett. 106, 071602 (2015)]

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Publisher's Note: 'Formation of a strontium buffer layer on Si(001) by pulsed-laser deposition through the Sr/Si(001)(2×3) surface reconstruction'[Appl. Phys. Lett. 106, 071602 (2015)]

机译：出版者注：“通过Sr / Si（001）（2×3）表面重建通过脉冲激光沉积在Si（001）上形成锶缓冲层” [Appl。物理来吧106，071602（2015）]

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This article was originally published online on 19 February 2015 with incorrect byline addresses. The addresses are correct as they appear above. All online versions of this article were corrected on 20 February 2015 and the article appears correct in the printed journal.

机译：本文最初于2015年2月19日在线发布，带有错误的署名地址。地址正确无误，如上所示。本文的所有在线版本均已于2015年2月20日得到更正，并且该文章在印刷期刊中显示为正确。

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来源
《Applied Physics Letters 》 |2015年第11期| 119901.1-119901.1| 共1页
作者
D. Klement; M. Spreitzer; D. Suvorov;
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作者单位

Advanced Materials Department, Jozef Stefan Institute, Jamova cesta 39,1000 Ljubljana, Slovenia ,Jozef Stefan International Postgraduate School, Jamova cesta 39,1000 Ljubljana, Slovenia;

Advanced Materials Department, Jozef Stefan Institute, Jamova cesta 39,1000 Ljubljana, Slovenia;

Advanced Materials Department, Jozef Stefan Institute, Jamova cesta 39,1000 Ljubljana, Slovenia;

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收录信息美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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正文语种 eng
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1. Formation of a strontium buffer layer on Si(001) by pulsed-laser deposition through the Sr/Si(001)(2 × 3) surface reconstruction [J] . D. Klement, M. Spreitzer, D. Suvorov Applied Physics Letters . 2015 ,第7期

机译：通过Sr / Si（001）（2×3）表面重建通过脉冲激光沉积在Si（001）上形成锶缓冲层
2. Control of SrO buffer-layer formation on Si(001) using the pulsed-laser deposition technique [J] . Jovanovic Z., Spreitzer M., Gabor U., RSC Advances . 2016 ,第85期

机译：使用脉冲激光沉积技术控制Si（001）上的SRE缓冲层形成
3. Control of SrO buffer-layer formation on Si(001) using the pulsed-laser deposition technique [J] . Z. Jovanovi?, M. Spreitzer, U. Gabor, RSC Advances . 2016 ,第85期

机译：使用脉冲激光沉积技术控制Si（001）上的SRE缓冲层形成
4. Epitaxial growth of oxide thin films on (001) metal surfaces using pulsed-laser deposition [C] . D.P.Norton, C.Park, B.Saffian, Symposium on Epitaxial Oxide Thin Films III March 31-April 2, 1997, San Francisco, California,U.S.A . 1997

机译：使用脉冲激光沉积在（001）金属表面上外延生长氧化物薄膜
5. Aspects of the strontium oxide-copper oxide-titanium dioxide ternary system related to the deposition of strontium titanate and copper doped strontium titanate thin film buffer layers. [D] . Ayala, Alicia. 2004

机译：氧化锶-氧化铜-二氧化钛三元体系的各方面与钛酸锶和铜掺杂的钛酸锶薄膜缓冲层的沉积有关。
6. Atom-to-atom interactions for atomic layer deposition of trimethylaluminum on Ga-rich GaAs(001)-4 × 6 and As-rich GaAs(001)-2 × 4 surfaces: a synchrotron radiation photoemission study [O] . Tun-Wen Pi, Hsiao-Yu Lin, Ya-Ting Liu, 2013

机译：富GaAs（001）-4×6和As富GaAs（001）-2×4表面上三甲基铝原子层沉积的原子-原子相互作用：同步辐射辐射光发射研究
7. Response to “Comment on ‘Determination of alloy composition and strain in multiple AlGaN buffer layers in GaN/Si system’” Appl. Phys. Lett. 106, 176101 (2015) [O] . Abdul Kadir, Chieh Chih Huang, Kenneth Eng Kian Lee, 2015

机译：响应GaN / Si System“Apmap中的多AlGaN缓冲层中合金组合物和菌株的响应。物理。吧。 106,176101（2015）

Publisher's Note: 'Formation of a strontium buffer layer on Si(001) by pulsed-laser deposition through the Sr/Si(001)(2×3) surface reconstruction'[Appl. Phys. Lett. 106, 071602 (2015)]

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