机译:溅射薄膜FeNi / Cu / FeCo三层中的指数衰减磁耦合
Department of Engineering Sciences, Uppsala University, 75121 Uppsala, Sweden;
Department of Engineering Sciences, Uppsala University, 75121 Uppsala, Sweden;
Department of Engineering Sciences, Uppsala University, 75121 Uppsala, Sweden;
Department of Physics, University of Colorado, Colorado Springs, Colorado 80918, USA;
Department of Engineering Sciences, Uppsala University, 75121 Uppsala, Sweden;
Department of Physics, University of Gothenburg, 41296 Gothenburg, Sweden;
Department of Physics and Astronomy, Uppsala University, 75120 Uppsala, Sweden;
Department of Engineering Sciences, Uppsala University, 75121 Uppsala, Sweden;
Department of Physics and Astronomy, Uppsala University, 75120 Uppsala, Sweden;
Department of Physics, University of Gothenburg, 41296 Gothenburg, Sweden;
Department of Engineering Sciences, Uppsala University, 75121 Uppsala, Sweden;
Department of Physics and Astronomy, Uppsala University, 75120 Uppsala, Sweden;
Department of Physics, University of Gothenburg, 41296 Gothenburg, Sweden,Department of Applied Physics and Microelectronics, Royal Institute of Technology, 10044 Kista, Sweden;
Department of Physics, University of Colorado, Colorado Springs, Colorado 80918, USA;
Department of Engineering Sciences, Uppsala University, 75121 Uppsala, Sweden;
机译:磁控溅射沉积具有定制磁性的纳米层压FeCoB / FeCo和FeCoB / NiFe软磁薄膜
机译:Feni / Cu / Feni薄膜在共面波导上的铁磁性共振,工作频率为1到20 GHz
机译:溅射FeCo薄膜在晶片内的各向异性
机译:Co / Ru / Co(Ag)和Co / Co / Co(Ag)三层膜中层间磁偶联的组成控制
机译:耦合的双层和三层薄膜的磁性。
机译:通过共溅射和溅射气体聚集获得的CO-Cu薄膜的磁传输性能
机译:Feni / Cu / Feni薄膜在共面波导上的铁磁共振,工作频率为1到20 GHz