首页> 外文期刊>Applied Physics Letters >Exponentially decaying magnetic coupling in sputtered thin film FeNi/Cu/FeCo trilayers
【24h】

Exponentially decaying magnetic coupling in sputtered thin film FeNi/Cu/FeCo trilayers

机译:溅射薄膜FeNi / Cu / FeCo三层中的指数衰减磁耦合

获取原文
获取原文并翻译 | 示例
       

摘要

Magnetic coupling in trilayer films of FeNi/Cu/FeCo deposited on Si/SiO_2 substrates have been studied. While the thicknesses of the FeNi and FeCo layers were kept constant at 100 A, the thickness of the Cu spacer was varied from 5 to 50 A. Both hysteresis loop and ferromagnetic resonance results indicate that all films are ferromagnetically coupled. Micromagnetic simulations well reproduce the ferromagnetic resonance mode positions measured by experiments, enabling the extraction of the coupling constants. Films with a thin Cu spacer are found to be strongly coupled, with an effective coupling constant of 3 erg/cm~2 for the sample with a 5 A Cu spacer. The strong coupling strength is qualitatively understood within the framework of a combined effect of Ruderman-Kittel-Kasuya-Yosida and pinhole coupling, which is evidenced by transmission electron microscopy analysis. The magnetic coupling constant surprisingly decreases exponentially with increasing Cu spacer thickness, without showing an oscillatory thickness dependence. This is partially connected to the substantial interfacial roughness that washes away the oscillation. The results have implications on the design of multilayers for spintronic applications.
机译:研究了在Si / SiO_2衬底上沉积的三层FeNi / Cu / FeCo薄膜的磁耦合。当FeNi和FeCo层的厚度保持恒定在100 A时,Cu隔层的厚度在5到50 A之间变化。磁滞回线和铁磁共振结果均表明所有膜都是铁磁耦合的。微磁仿真很好地再现了通过实验测得的铁磁共振模式位置,从而能够提取耦合常数。发现具有薄的铜间隔物的薄膜被牢固地耦合,对于具有5 A铜间隔物的样品,其有效耦合常数为3 erg / cm〜2。在Ruderman-Kittel-Kasuya-Yosida和针孔耦合的组合效应的框架内,定性地理解了强耦合强度,这通过透射电子显微镜分析得到了证明。磁耦合常数出人意料地随着铜间隔件厚度的增加而呈指数下降,而没有表现出振荡厚度依赖性。这部分地与大量的界面粗糙度相连,该粗糙度消除了振荡。结果对自旋电子学应用的多层设计有影响。

著录项

  • 来源
    《Applied Physics Letters》 |2015年第4期|042405.1-042405.4|共4页
  • 作者单位

    Department of Engineering Sciences, Uppsala University, 75121 Uppsala, Sweden;

    Department of Engineering Sciences, Uppsala University, 75121 Uppsala, Sweden;

    Department of Engineering Sciences, Uppsala University, 75121 Uppsala, Sweden;

    Department of Physics, University of Colorado, Colorado Springs, Colorado 80918, USA;

    Department of Engineering Sciences, Uppsala University, 75121 Uppsala, Sweden;

    Department of Physics, University of Gothenburg, 41296 Gothenburg, Sweden;

    Department of Physics and Astronomy, Uppsala University, 75120 Uppsala, Sweden;

    Department of Engineering Sciences, Uppsala University, 75121 Uppsala, Sweden;

    Department of Physics and Astronomy, Uppsala University, 75120 Uppsala, Sweden;

    Department of Physics, University of Gothenburg, 41296 Gothenburg, Sweden;

    Department of Engineering Sciences, Uppsala University, 75121 Uppsala, Sweden;

    Department of Physics and Astronomy, Uppsala University, 75120 Uppsala, Sweden;

    Department of Physics, University of Gothenburg, 41296 Gothenburg, Sweden,Department of Applied Physics and Microelectronics, Royal Institute of Technology, 10044 Kista, Sweden;

    Department of Physics, University of Colorado, Colorado Springs, Colorado 80918, USA;

    Department of Engineering Sciences, Uppsala University, 75121 Uppsala, Sweden;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

  • 入库时间 2022-08-18 03:15:04

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号