Response to 'Comment on Thickness and temperature depending intermixing of SiO_x/SiO_2 and SiO_xN_y/SiO_2 superlattices: Experimental observation and thermodynamic modeling' ' [Appl. Phys. Lett. 109,166101 (2016)]

摘要

We hereby dispel the doubts appeared in the Comment by Hiller et al. concerning our experimental observation and theoretical explanation of the intermixing effect in SiO_x/ SiO_2 and SiO_xN_y/SiO_2 superlattices (SLs). We do not accept that our direct demonstration of the superlattice (SL) breakdown in the limit of ultrathin SiO_x or SiO_xN_y layers can be denied solely on the basis of photolumi-nescence (PL) spectra analysis without any supporting structural data. Furthermore, as shown below, the corresponding argumentation presented in Ref. 1 is based on the incorrect assumptions. At the same time, Hiller et al. also studied the structural properties of similar SiO_x/SiO_2 and SiO_xN_y/SiO_2 multilayered samples, including the case of ultrathin SiO_x or SiO_xN_y layers. The corresponding results are summarized, in particular, in two Ph.D. theses containing a lot of relevant transmission electron microscopy (TEM) data, which, however, were not cited in Ref. 1. And, what is more important to note, the intermixing effect identical to that claimed by us was already observed (but not explained) by TEM study of SiO_xN_y/SiO_2 multilayered films, similar to our CVD samples and produced under the same conditions using the same equipment (see pp. 37-38 in Ref. 4).