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Effect of asymmetric concentration profile on thermal conductivity in Ge/SiGe superlattices

机译:非对称浓度分布对Ge / SiGe超晶格热导率的影响

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摘要

The effect of the chemical composition in Si/Ge-based superlattices on their thermal conductivity has been investigated using molecular dynamics simulations. Simulation cells of Ge/SiGe superlattices have been generated with different concentration profiles such that the Si concentration follows a step-like, a tooth-saw, a Gaussian, and a gamma-type function in direction of the heat flux. The step-like and tooth-saw profiles mimic ideally sharp interfaces, whereas Gaussian and gamma-type profiles are smooth functions imitating atomic diffusion at the interface as obtained experimentally. Symmetry effects have been investigated comparing the symmetric profiles of the step-like and the Gaussian function to the asymmetric profiles of the tooth-saw and the gamma-type function. At longer sample length and similar degree of interdiffusion, the thermal conductivity is found to be lower in asymmetric profiles. Furthermore, it is found that with smooth concentration profiles where atomic diffusion at the interface takes place the thermal conductivity is higher compared to systems with atomically sharp concentration profiles.
机译:使用分子动力学模拟研究了Si / Ge基超晶格中化学成分对其导热系数的影响。已生成具有不同浓度分布的Ge / SiGe超晶格模拟单元,以使Si浓度在热通量方向上遵循阶梯状,锯齿状,高斯和伽马型函数。阶梯状和锯齿形轮廓模仿理想的尖锐界面,而高斯和伽马型轮廓则是平滑函数,模仿通过实验获得的界面原子扩散。研究人员比较了阶梯状和高斯函数的对称轮廓与锯齿和伽马型函数的非对称轮廓的对称效果。在更长的样品长度和相似的相互扩散程度下,发现非对称轮廓的热导率较低。此外,发现与在原子上具有尖锐的浓度分布的系统相比,具有在界面处发生原子扩散的平滑的浓度分布,热导率更高。

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  • 来源
    《Applied Physics Letters》 |2016年第20期|203102.1-203102.5|共5页
  • 作者单位

    Department of Physics, University of Cagliari, Cittadella Universitaria, 09042 Monserrato (CA), Italy;

    Department of Epitaxy, Paul-Drude-Institut fuer Festkoerperelektronik, Hausvogteiplatz 5-7,10117 Berlin, Germany;

    Department of Physics, University of Cagliari, Cittadella Universitaria, 09042 Monserrato (CA), Italy,Institut de Ciencia de Materials de Barcelona (ICMAB-CSIC), Campus UAB, Bellaterra, 08193 Barcelona, Spain,Catalan Institute of Nanoscience and Nanotechnology (ICN2), CSIC and The Barcelona Institute of Science and Technology, Campus UAB, Bellaterra, 08193 Barcelona, Spain;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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