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Influence of metal choice on (010) β-Ga_2O_3 Schottky diode properties

机译:金属选择对(010)β-Ga_2O_3肖特基二极管性能的影响

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摘要

A systematic study of Schottky barriers fabricated on (010) β-Ga_2_O_ substrates is reported. Schottky barrier heights (SBHs) and current transport modes were analyzed using a combination of current-voltage (I-V), capacitance-voltage (C-V) and internal photoemission (IPE) measurements for Pd, Ni, Pt and Au Schottky diodes. Diodes fabricated for each metal choice displayed nearly ideal I-V characteristics with room temperature ideality factors ranging from 1.03 to 1.09, reverse leakage currents below detection limits and thermionic emission as the dominant current transport mode for Ni, Pt and Pd. The SBH values varied depending on the metal choice, ranging from 1.27 V for Pd and 1.54 V for Ni to 1.58 V for Pt and 1.71 V for Au, as determined using IPE measurements. Close agreement was observed between these IPE-determined SBH values and the barrier height values from I-V and C-V measurements for the Ni, Pd and Pt Schottky barriers. In contrast, for Au, a lack of general agreement was seen between the SBH measurement methods, the trends of which appear to be consistent with the presence of an inhomogeneous barrier that implies a more complex interface for the Au Schottky barrier. The dependence of the SBH on metal work function suggests that metal-(010) β-Ga_2O_3 interfaces are not fully pinned, and this assertion was supported by scanning Kelvin probe microscopy measurements made on this sample set.
机译:报道了在(010)β-Ga_2_O_衬底上制备的肖特基势垒的系统研究。肖特基势垒高度(SBHs)和电流传输模式是结合电流电压(I-V),电容电压(C-V)和内部光发射(IPE)测量来对Pd,Ni,Pt和Au肖特基二极管进行分析的。为每种金属选择制造的二极管显示出近乎理想的I-V特性,室温理想因子范围为1.03至1.09,反向泄漏电流低于检测极限,并且热电子发射是Ni,Pt和Pd的主要电流传输模式。 SBH值取决于金属选择,其范围从使用IPE测量确定的Pd的1.27 V和Ni的1.54 V到Pt的1.58 V和Au的1.71 V不等。在这些IPE确定的SBH值与针对Ni,Pd和Pt肖特基势垒的I-V和C-V测量得出的势垒高度值之间,观察到了密切的一致性。相反,对于Au,在SBH测量方法之间未达成普遍共识,其趋势似乎与存在不均匀的势垒一致,这意味着Au Schottky势垒的界面更加复杂。 SBH对金属功函数的依赖性表明,金属-(010)β-Ga_2O_3界面未完全固定,并且通过在此样品组上进行的扫描开尔文探针显微镜测量得到了这一结论。

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  • 来源
    《Applied Physics Letters》 |2017年第20期|202102.1-202102.5|共5页
  • 作者单位

    Department of Electrical and Computer Engineering, The Ohio State University, Columbus, Ohio 43210, USA;

    Department of Electrical and Computer Engineering, The Ohio State University, Columbus, Ohio 43210, USA;

    Department of Electrical and Computer Engineering, The Ohio State University, Columbus, Ohio 43210, USA;

    Department of Electrical and Computer Engineering, The Ohio State University, Columbus, Ohio 43210, USA;

    Department of Electrical and Computer Engineering, The Ohio State University, Columbus, Ohio 43210, USA;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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  • 入库时间 2022-08-18 03:14:05

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