机译:通过MESA图案的GE-ON-SI对应变SiGe的临界厚度急剧增加
Tokyo City Univ Adv Res Labs 8-15-1 Todoroki Tokyo Tokyo 1580082 Japan;
Tokyo City Univ Adv Res Labs 8-15-1 Todoroki Tokyo Tokyo 1580082 Japan|Univ Barishal Dept Phys Barishal 8200 Bangladesh;
Tokyo City Univ Adv Res Labs 8-15-1 Todoroki Tokyo Tokyo 1580082 Japan;
Osaka Univ Grad Sch Engn Sci Ctr Spintron Res Network Toyonaka Osaka 5608531 Japan;
Osaka Univ Grad Sch Engn Sci Ctr Spintron Res Network Toyonaka Osaka 5608531 Japan;
Tokyo City Univ Adv Res Labs 8-15-1 Todoroki Tokyo Tokyo 1580082 Japan;
SiGe; strain; critical thickness; Ge-on-Si;