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首页> 外文期刊>Annales de l'I.H.P >Forward thermionic field emission transport and significant image force lowering caused by high electric field at metal/heavily-doped SiC Schottky interfaces
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Forward thermionic field emission transport and significant image force lowering caused by high electric field at metal/heavily-doped SiC Schottky interfaces

机译:金属/重掺杂SiC肖特基界面的高电场引起的高电场发射输送和显着的图像力降低

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We investigated the doping concentration dependence of the barrier height and forward carrier transport mechanism in Ni/SiC Schottky barrier diodes (SBDs) in the wide range of 6.8 x 10(15) -1.8 x 10(19) cm(-3). Forward current-voltage characteristics in heavily-doped SiC SBDs ( 2.6 x 10(17) cm(-3)) can be well reproduced by a thermionic field emission model. The barrier height decreased with increasing doping concentration and the barrier height drop in the most heavily-doped SBD (1.8 x 10(19) cm(-3)) was about 0.2 eV, which quantitatively agreed with the image force lowering of 0.18 eV caused by the high electric field. (c) 2020 The Japan Society of Applied Physics
机译:我们在宽范围为6.8×10(15)-1.8×10(-3)中,研究了在Ni / SiC肖特基势垒二极管(SBD)中的阻挡高度和前载流量机制的掺杂浓度依赖性。通过热离子场发射模型,可以很好地再现掺杂SiC SCS(> 2.6×10(17)cm(-3)的正电压特性。随着掺杂浓度的增加,最重掺杂的SBD(1.8×10(19)cm(-3))的阻挡高度下降为约0.2eV,其定量同意0.18 eV引起的图像力降低的约0.2eV。由高电场。 (c)2020日本应用物理学会

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