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CIGS absorber preparation by non-vacuum particle-based screen printing and RTA densification

机译:通过非真空颗粒丝网印刷和RTA致密化制备CIGS吸收剂

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摘要

CuIn0.7Ga0.3Se2 (CIGS) thin-films are prepared by the particle-based screen printing technique followed by rapid thermal annealing (RTA) densification. Due to the short RTA time, CIGS absorber remains the ideal stoichiometric ratio originated from the CIGS particles in the coating paste and thus the conventional selenization process is not required. The effects of the particle concentrations of the coating paste, the RTA temperature and normal loading during RTA on the performances of the CIGS thin-films are studied. The film thickness increases with the increase of the particle concentration of the coating paste. The carbon content of the film is nearly zero when the RTA temperature is greater than 650 degrees C. The carrier concentration and Hall mobility of the CIGS film increase when increasing the RTA temperature from 300 degrees C to 650 degrees C. Using the coating paste with a particle concentration of 40 wt% for screen printing and a three-step, 250 degrees C solvent removal for 5 min, 500 degrees C annealing for 7 min and 650 degrees C densification for 3 min, 1.97 N cm(-2) normal loading RTA process, a p-type chalcopyrite CIGS film with the carrier concentration of 1.23 x 10(15) cm(3) and mobility of 26.21 cm(2) V-1 s(-1) is obtained. (C) 2015 Elsevier Ltd. All rights reserved.
机译:CuIn0.7Ga0.3Se2(CIGS)薄膜是通过基于颗粒的丝网印刷技术,然后进行快速热退火(RTA)致密化而制备的。由于较短的RTA时间,CIGS吸收剂保持了理想的化学计量比,源于涂料浆料中的CIGS颗粒,因此不需要常规的硒化工艺。研究了涂料浆料的颗粒浓度,RTA温度和RTA过程中的正常载荷对CIGS薄膜性能的影响。膜厚随着涂料浆料的颗粒浓度的增加而增加。当RTA温度高于650摄氏度时,薄膜的碳含量几乎为零。当将RTA温度从300摄氏度提高至650摄氏度时,CIGS薄膜的载流子浓度和霍尔迁移率增加。丝网印刷的颗粒浓度为40 wt%,分三步进行,250摄氏度的溶剂去除5分钟,500摄氏度的退火7分钟,650摄氏度的致密化3分钟,1.97 N cm(-2)正常负载RTA过程中,获得了一种p型黄铜矿CIGS膜,其载流子浓度为1.23 x 10(15)cm(3),迁移率为26.21 cm(2)V-1 s(-1)。 (C)2015 Elsevier Ltd.保留所有权利。

著录项

  • 来源
    《Applied Energy》 |2016年第15期|1003-1011|共9页
  • 作者单位

    Chang Gung Univ, Dept Chem & Mat Engn, Taoyuan 333, Taiwan;

    Chang Gung Univ, Dept Chem & Mat Engn, Taoyuan 333, Taiwan;

    Chang Gung Univ, Dept Chem & Mat Engn, Taoyuan 333, Taiwan;

    Chung Shan Inst Sci & Technol, Missile & Rocket Syst Res Div, Taoyuan 325, Taiwan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    CIGS; Non-vacuum; Screen printing; Normal loading RTA;

    机译:CIGS;非真空;丝网印刷;常规加载RTA;

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