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首页> 外文期刊>Advanced Materials >Direct Synthesis and Enhanced Rectification of Alloy-to-Alloy 2D Type-Ⅱ MoS_(2(1-x))Se_(2x)/SnS_(2(1-y)Se_(2y) Heterostructures
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Direct Synthesis and Enhanced Rectification of Alloy-to-Alloy 2D Type-Ⅱ MoS_(2(1-x))Se_(2x)/SnS_(2(1-y)Se_(2y) Heterostructures

机译:合金与合金2DⅡ型MOS_(2(1-X))SE_(2X)/ SNS_(2(1-Y)SE_(2Y)异质结构的直接合成和增强整流

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摘要

The interfacial tunable band alignment of heterostructures is coveted in device design and optimization of device performance. As an intentional approach, alloying allows band engineering and continuous band-edge tunability for low-dimensional semiconductors. Thus, combining the tunability of alloying with the band structure of a heterostructure is highly desirable for the improvement of device characteristics. In this work, the single-step growth of alloy-to-alloy (MoS2(1-x)Se2x/SnS2(1-y)Se2y) 2D vertical heterostructures is demonstrated. Electron diffraction reveals the well-aligned heteroepitaxial relationship for the heterostructure, and a near-atomically sharp and defect-free boundary along the interface is observed. The nearly intrinsic van der Waals (vdW) interface enables measurement of the intrinsic behaviors of the heterostructures. The optimized type-II band alignment for the MoS2(1-x)Se2x/SnS2(1-y)Se2y heterostructure, along with the large band offset and effective charge transfer, is confirmed through quenched PL spectroscopy combined with density functional theory calculations. Devices based on completely stacked heterostructures show one or two orders enhanced electron mobility and rectification ratio than those of the constituent materials. The realization of device-quality alloy-to-alloy heterostructures provides a new material platform for precisely tuning band alignment and optimizing device applications.
机译:异质结构的界面可调带对准在器件设计和设备性能优化中进行了垂涎。作为一种故意的方法,合金化允许用于低维半导体的带工程和连续带边可调性。因此,对于改善装置特性,非常希望与异质结构的带状结构结合合金化的可调性。在这项工作中,对合金对合金的单步生长(MOS2(1-x)Se2x / Sn02(1-Y)Se2y)2D垂直异质结构进行说明。电子衍射揭示了异质结构的良好对准的异质关系,并且观察到沿着界面的近主尖锐和缺陷的边界。几乎内在的范德华(VDW)界面可以测量异质结构的内在行为。通过淬火的PL光谱与密度泛函理论计算结合,确认了MOS2(1-X)SE2X / SNS2(1-Y)SE2Y异质结构的优化Type-II带对准和有效电荷转移。基于完全堆叠异质结构的器件显示出一种或两个的阶数增强的电子迁移率和整流比比构成材料的变化。实现设备质量合金对合金异质结构提供了一种新的材料平台,用于精确调谐带对准和优化装置应用。

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  • 来源
    《Advanced Materials》 |2021年第8期|2006908.1-2006908.8|共8页
  • 作者单位

    Chinese Acad Sci Inst Semicond State Key Lab Superlattices & Microstruct Beijing 100083 Peoples R China|Univ Chinese Acad Sci Ctr Mat Sci & Optoelect Engn Beijing 100049 Peoples R China;

    Chinese Acad Sci Inst Semicond State Key Lab Superlattices & Microstruct Beijing 100083 Peoples R China|Univ Chinese Acad Sci Ctr Mat Sci & Optoelect Engn Beijing 100049 Peoples R China;

    Chinese Acad Sci Inst Semicond State Key Lab Superlattices & Microstruct Beijing 100083 Peoples R China;

    Hunan Univ Sch Phys & Elect Dept Appl Phys Hunan Key Lab Two Dimens Mat Changsha 410082 Peoples R China;

    Chinese Acad Sci Inst Semicond State Key Lab Superlattices & Microstruct Beijing 100083 Peoples R China;

    Chinese Acad Sci Inst Semicond State Key Lab Superlattices & Microstruct Beijing 100083 Peoples R China|Univ Chinese Acad Sci Ctr Mat Sci & Optoelect Engn Beijing 100049 Peoples R China;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    alloy-to-alloy vertical heterostructures; direct synthesis; MoS2(1-x)Se2x/SnS2(1-y)Se2y; transport properties; type-II heterostructures;

    机译:合金对合金垂直异质结构;直接合成;MOS2(1-X)SE2x / SNS2(1-Y)SE2Y;运输特性;II型异质结构;
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