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Orders-of-Magnitude Reduction of the Contact Resistance in Short-Channel Hot Embossed Organic Thin Film Transistors by Oxidative Treatment of Au-Electrodes

机译:通过金电极的氧化处理降低短通道热压花有机薄膜晶体管的接触电阻的数量级

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摘要

In this study we report on the optimization of the contact resistance by surface treatment in short-channel bottom-contact OTFTs based on pentacene as semiconductor and SiO_2 as gate dielectric. The devices have been fabricated by means of nanoimprint lithography with channel lengths in the range of 0.3 μm < L < 3.0 μm. In order to reduce the contact resistance the Au source- and drain-contacts were subjected to a special UV/ozone treatment, which induced the formation of a thin AuO_x layer. It turned out, that the treatment is very effective (i) in decreasing the hole-injection barrier between Au and pentacene and (ii) in improving the morphology of pentacene on top of the Au contacts and thus reducing the access resistance of carriers to the channel. Contact resistance values as low as 80 Ω cm were achieved for gate voltages well above the threshold. In devices with untreated contacts, the charge carrier mobility shows a power-law dependence on the channel length, which is closely related to the contact resistance and to the grain-size of the pentacene crystallites. Devices with UV/ozone treated contacts of very low resistance, however, exhibit a charge carrier mobility in the range of 0.3 cm~2 V~(-1) s~(-1) < μ < 0.4 cm~2 V~(-1) s~(-1) independent of the channel length.
机译:在这项研究中,我们报告了在以并五苯作为半导体和SiO_2作为栅极电介质的短通道底部接触OTFT中通过表面处理优化接触电阻的方法。这些器件是通过纳米压印光刻技术制造的,通道长度在0.3μm<L <3.0μm的范围内。为了降低接触电阻,对金的源极和漏极接触点进行了特殊的UV /臭氧处理,这导致形成了薄的AuO_x层。事实证明,该处理非常有效(i)降低Au和并五苯之间的空穴注入势垒,以及(ii)改善Au触点顶部并五苯的形态,从而降低载流子对金属的接触阻力。渠道。对于远高于阈值的栅极电压,可实现低至80Ωcm的接触电阻值。在具有未处理接触的器件中,电荷载流子迁移率显示出与沟道长度相关的幂律,这与接触电阻和并五苯晶体的晶粒尺寸密切相关。但是,经过紫外线/臭氧处理的触点电阻极低的器件的载流子迁移率在0.3 cm〜2 V〜(-1)s〜(-1)<μ<0.4 cm〜2 V〜(- 1)s〜(-1)与通道长度无关。

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