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首页> 外文期刊>Advanced Functional Materials >The Dependence of Device Dark Current on the Active-Layer Morphology of Solution-Processed Organic Photodetectors
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The Dependence of Device Dark Current on the Active-Layer Morphology of Solution-Processed Organic Photodetectors

机译:器件暗电流对溶液处理有机光电探测器有源层形貌的依赖性

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摘要

Organic photodiodes are presented that utilize solution-processed perylene diimide bulk heterojunctions as the device photoactive layer. The polymer (9,9'-dioctylfluorene-co-benzothiadiazole; F8BT) is used as the electron donor and the N,N'-bis(1-ethylpropyl)-3,4,9,10-perylenetetracarboxylic diimide (PDI) derivative is used as the electron acceptor. The thickness-dependent study of the main device parameters, namely of the external quantum efficiency (EQE), the short-circuit current (I_(SC)), the open-circuit voltage (V_(OC)), the fill factor (FF), and the dark current (I_D) is presented. In as-spun F8BT:PDI devices the short-circuit EQE reaches the maximum of 17% and the V_(OC) value is as high as 0.8 V. Device I_D is in the nA mm~(-2) regime and it correlates with the topography of the F8BT:PDI layer. For a range of annealing temperatures I_D is monitored as the morphology of the photoactive layer changes. The changes in the morphology of the photoactive layer are monitored via atomic force microscopy. The thermally induced coalescence of the PDI domains assists the dark conductivity of the device. I_D values as low as 80 pA mm~(-2) are achieved with a corresponding EQE of 9%, when an electron-blocking layer (EB) is used in bilayer EB/F8BT:PDI devices. Electron injection from the hole-collecting electrode to the F8BT:PDI medium is hindered by the use of the EB layer. The temperature dependence of the ID value of the as-spun F8BT:PDI device is studied in the range of 296-216 K. In combination with the thickness and the composition dependence of I_D? the determined activation energy E_a suggests a two-step mechanism of I_D generation; a temperature-independent step of electric-field-assisted carrier injection from the device contacts to the active-layer medium and a thermally activated step of carrier transport across the device electrodes, via the PDI domains of the photoactive layer. Moreover, device I_D is found to be sensitive to environmental factors.
机译:提出了利用溶液处理的utilize二酰亚胺本体异质结作为器件光敏层的有机光电二极管。聚合物(9,9'-二辛基芴-共苯并噻二唑; F8BT)用作电子给体,N,N'-双(1-乙基丙基)-3,4,9,10-per四羧酸二酰亚胺(PDI)衍生物用作电子受体。主要器件参数的厚度依赖性研究,即外部量子效率(EQE),短路电流(I_(SC)),开路电压(V_(OC)),填充系数(FF) ),并显示暗电流(I_D)。在快速旋转的F8BT:PDI器件中,短路EQE达到最大值的17%,V_(OC)值高达0.8V。器件I_D处于nA mm〜(-2)态,并且与F8BT:PDI层的地形。对于一定范围的退火温度,随着光敏层的形态变化来监测I_D。通过原子力显微镜监测光敏层的形态变化。 PDI域的热诱导聚结有助于器件的暗电导率。当在双层EB / F8BT:PDI器件中使用电子阻挡层(EB)时,以9%的对应EQE可以实现低至80 pA mm〜(-2)的I_D值。通过使用EB层阻止了从空穴收集电极向F8BT:PDI介质的电子注入。研究了初纺F8BT:PDI器件的ID值在296-216 K范围内的温度依赖性。结合I_D?的厚度和成分依赖性?确定的活化能E_a暗示了I_D生成的两步机制。电场辅助载流子从器件接触到有源层介质的与温度无关的步骤,以及载流子通过光敏层的PDI域跨器件电极的热激活步骤。此外,发现设备ID对环境因素敏感。

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  • 来源
    《Advanced Functional Materials》 |2010年第22期|p.3895-3903|共9页
  • 作者单位

    Experimental Solid State Physics Croup The Blackett Laboratory Department of Physics Imperial College Prince Consort Road, London SW7 2BZ (UK);

    Optoelectronics Croup Cavendish Laboratory J. J. Thomson Avenue Cambridge CB3 OHE (UK),Department of Physics National University of Singapore Lower Kent Ridge Road (Singapore) SI 17542;

    Optoelectronics Croup Cavendish Laboratory J. J. Thomson Avenue Cambridge CB3 OHE (UK);

    Optoelectronics Croup Cavendish Laboratory J. J. Thomson Avenue Cambridge CB3 OHE (UK);

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