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Configuration-Dependent Electrically Tunable Van der Waals Heterostructures Based on MoTe2/MoS2

机译:基于MoTe2 / MoS2的与结构有关的电可调范德华异质结构

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摘要

Van der Waals heterostructures (vdWHs), obtained by artificially stacking 2D layered material (2DLM) plains upon each other, are brand new structures that have exhibited novel electronic and optoelectronic properties and attracted a great deal of attention. So far, the results are only based on devices with symmetrical configurations: devices predominated by vdWH parts, or cross-like configurations combined with both vdWHs and extra individual 2DLM layers. Quite different gate tunable phenomena have been observed for these two configurations even though 2DLMs with similar band alignments were used, which may be due to the different device configurations utilized. For a deeper understanding, rational investigation on configuration-dependent properties of vdWHs is needed. Here, using MoTe2/MoS2 as an example, vdWH device is artificially designed with two asymmetrical configurations. Through comparing the respective results, it is found that the properties that stem only from the vdWH, i.e., the rectification behavior and open voltage in photovoltaic effect, are independent of the device structures. However, other properties, i.e., drain currents, short circuit currents, and photo reponse performances, strongly depend on the configuration used. These results give a guideline on studying the intrinsic properties of vdWHs and optimizing the device structures for better performances.
机译:通过将2D层状材料(2DLM)平面彼此人工堆叠而获得的范德华异质结构(vdWHs)是崭新的结构,具有新颖的电子和光电特性,并引起了广泛的关注。到目前为止,结果仅基于具有对称配置的设备:以vdWH部件为主的设备,或与vdWH和额外的单独2DLM层组合的十字形配置。即使使用了具有相似频带对齐的2DLM,对于这两种配置也观察到了完全不同的栅极可调现象,这可能是由于所使用的器件配置不同所致。为了更深入地了解,需要对vdWH的依赖于配置的属性进行合理的研究。在此,以MoTe2 / MoS2为例,vdWH器件是人为设计的,具有两个不对称的配置。通过比较各个结果,发现仅源自vdWH的特性,即光伏效应中的整流行为和开路电压,与器件结构无关。但是,其他特性,即漏极电流,短路电流和光响应性能,在很大程度上取决于所使用的配置。这些结果为研究vdWH的固有特性以及优化器件结构以获得更好的性能提供了指导。

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  • 来源
    《Advanced Functional Materials 》 |2016年第30期| 5499-5506| 共8页
  • 作者单位

    Natl Ctr Nanosci & Technol, CAS Key Lab Nanosyst & Hierarch Fabricat, Beijing 100190, Peoples R China;

    Natl Ctr Nanosci & Technol, CAS Key Lab Nanosyst & Hierarch Fabricat, Beijing 100190, Peoples R China;

    Natl Ctr Nanosci & Technol, CAS Key Lab Nanosyst & Hierarch Fabricat, Beijing 100190, Peoples R China;

    Natl Ctr Nanosci & Technol, CAS Key Lab Nanosyst & Hierarch Fabricat, Beijing 100190, Peoples R China;

    Natl Ctr Nanosci & Technol, CAS Key Lab Nanosyst & Hierarch Fabricat, Beijing 100190, Peoples R China;

    Natl Ctr Nanosci & Technol, CAS Key Lab Nanosyst & Hierarch Fabricat, Beijing 100190, Peoples R China;

    Natl Ctr Nanosci & Technol, CAS Key Lab Nanosyst & Hierarch Fabricat, Beijing 100190, Peoples R China;

    Natl Ctr Nanosci & Technol, CAS Key Lab Nanosyst & Hierarch Fabricat, Beijing 100190, Peoples R China;

    Natl Ctr Nanosci & Technol, CAS Key Lab Nanosyst & Hierarch Fabricat, Beijing 100190, Peoples R China;

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