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首页> 外文期刊>Advanced Functional Materials >A Novel Approach for Achieving High-Efficiency Photoelectrochemical Water Oxidation in InGaN Nanorods Grown on Si System: MXene Nanosheets as Multifunctional Interfacial Modifier
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A Novel Approach for Achieving High-Efficiency Photoelectrochemical Water Oxidation in InGaN Nanorods Grown on Si System: MXene Nanosheets as Multifunctional Interfacial Modifier

机译:Si系统上生长的InGaN纳米棒中实现高效光电化学水氧化的新方法:MXene纳米片作为多功能界面改性剂

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MXene nanosheets with attractive electrical conductivity and tunable work function have been adopted as multifunctional interfacial modifier between InGaN nanorods and Si for photoelectrochemical water oxidation for the first time. Compared to bare InGaN/Si systems, MXene interfacial layers give rise to an ultralow onset potential of 75 mV versus reversible hydrogen electrode (RHE), which is the highest ever reported for InGaN- or Si-based photoanodes by interfacial modification. Furthermore, the modified photoanode exhibits a significantly enhanced photocurrent density (7.27 mA cm(-2)) at 1.23 V versus RHE, which is about 10 times higher than that achieved with the InGaN/Si photoanode. The detailed mechanism demonstrates that the formed type-II band alignment in InGaN/MXene heterojunction and an Ohmic junction at the MXene/Si interface make MXene an ideal electron-migration channel to enhance charge separation and transfer process. This synergetic effect of MXene can significantly decrease the charge resistance at semiconductor/Si and semiconductor/electrolyte hetero-interfaces, eventually resulting in the fast hole injection efficiency of 82% and superior stability against photocorrosion. This work not only provides valuable guidance for designing high-efficiency photoelectrodes through the integration of multiscale and multifunctional materials, but also presents a novel strategy for achieving high-performance artificial photosynthesis by introducing interfacial modifier.
机译:具有吸引力的导电性和可调节功函数的MXene纳米片首次被用作InGaN纳米棒和Si之间的多功能界面改性剂,用于光电化学水氧化。与裸露的InGaN / Si系统相比,与可逆氢电极(RHE)相比,MXene界面层可产生75 mV的超低启动电位,这是有史以来通过界面修饰的基于InGaN或Si的光阳极的最高报道。此外,与RHE相比,改性的光阳极在1.23 V电压下具有显着增强的光电流密度(7.27 mA cm(-2)),这比InGaN / Si光阳极高出约10倍。详细的机理证明,在InGaN / MXene异质结中形成的II型能带对准和MXene / Si界面处的欧姆结使MXene成为理想的电子迁移通道,可增强电荷分离和转移过程。 MXene的这种协同作用可以显着降低半导体/ Si和半导体/电解质异质界面的电荷电阻,最终导致82%的快速空穴注入效率和出色的抗光腐蚀稳定性。这项工作不仅为通过集成多尺度和多功能材料设计高效光电极提供了有价值的指导,而且为通过引入界面改性剂实现高性能人工光合作用提出了一种新的策略。

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