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首页> 外文期刊>Advanced energy materials >Porous Nanomaterials for Ultrabroadband Omnidirectional Anti-Reflection Surfaces with Applications in High Concentration Photovoltaics
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Porous Nanomaterials for Ultrabroadband Omnidirectional Anti-Reflection Surfaces with Applications in High Concentration Photovoltaics

机译:用于超宽带全向抗反射表面的多孔纳米材料及其在高浓度光伏中的应用

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摘要

Materials for nanoporous coatings that exploit optimized chemistries and self-assembly processes offer capabilities to reach approximate to 98% transmission efficiency and negligible scattering losses over the broad wavelength range of the solar spectrum from 350 nm to 1.5 mu m, on both flat and curved glass substrates. These nanomaterial anti-reflection coatings also offer wide acceptance angles, up to +/- 40 degrees, for both s- and p-polarization states of incident light. Carefully controlled bilayer films have allowed for the fabrication of dual-sided, gradient index profiles on plano-convex lens elements. In concentration photovoltaics platforms, the resultant enhancements in the photovoltaics efficiencies are approximate to 8%, as defined by experimental measurements on systems that use microscale triple-junction solar cells. These materials and their applications in technologies that require control over interface reflections have the potential for broad utility in imaging systems, photolithography, light-emitting diodes, and display technologies.
机译:利用优化化学性质和自组装工艺的纳米多孔涂料材料,在平板玻璃和曲面玻璃上,在从350 nm到1.5μm的太阳光谱的宽波长范围内,都能达到大约98%的传输效率,并且散射损失可忽略不计基材。这些纳米材料抗反射涂层还为入射光的s和p偏振态提供了高达+/- 40度的宽接受角。精心控制的双层薄膜已允许在平凸透镜元件上制造双面梯度折射率分布图。在聚光光伏平台中,光伏效率的最终提高约为8%,这是通过对使用微型三结太阳能电池的系统进行的实验测量得出的。这些材料及其在需要控制界面反射的技术中的应用具有在成像系统,光刻,发光二极管和显示技术中广泛应用的潜力。

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  • 来源
    《Advanced energy materials 》 |2017年第7期| 1601992.1-1601992.9| 共9页
  • 作者单位

    Univ Illinois, Dept Chem, Urbana, IL 61801 USA;

    Univ Illinois, Dept Mat Sci & Engn, Frederick Seitz Mat Res Lab, Urbana, IL 61801 USA;

    Tsinghua Univ, Dept Elect Engn, Beijing 100084, Peoples R China;

    CALTECH, Div Engn & Appl Sci, Pasadena, CA 91125 USA;

    JA Woollam Co Inc, Lincoln, NE 68508 USA;

    Univ Illinois, Dept Chem, Urbana, IL 61801 USA;

    KAUST, CEMSE Div, Integrated Nanotechnol Lab, Thuwal 23955, Saudi Arabia;

    CALTECH, Div Engn & Appl Sci, Pasadena, CA 91125 USA|CALTECH, Joint Ctr Artificial Photosynthesis, Pasadena, CA 91125 USA|CALTECH, Kavli Nanosci Inst, Pasadena, CA 91125 USA;

    CALTECH, Kavli Nanosci Inst, Pasadena, CA 91125 USA|CALTECH, Beckman Inst, Div Chem & Chem Engn, Pasadena, CA 91125 USA;

    Univ Illinois, Dept Chem, Urbana, IL 61801 USA|Univ Illinois, Dept Mat Sci & Engn, Frederick Seitz Mat Res Lab, Urbana, IL 61801 USA;

    Univ Illinois, Dept Mat Sci & Engn, Frederick Seitz Mat Res Lab, Urbana, IL 61801 USA;

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