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A novel oligo-pyrazole-based thin film: synthesis characterization optical and morphological properties

机译:一种基于低聚吡唑的新型薄膜:合成表征光学和形态学性质

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摘要

Pyrazole-3,4-dicarboxylic acid >2 was synthesized via the hydrolysis of pyrazole-3-carboxylic acid >1 and subsequently heated with thionyl chloride to give the novel pyrazole-3,4-dicarbonyl dichloride >3, which was easily converted into oligo-pyrazole >4 upon its reaction with p-phenylene-diamine. These newly synthesized compounds were characterized by 1H-NMR, 13C-NMR, and FT-IR spectroscopy, and gel permission chromatography (GPC). Three novel oligo-pyrazole thin films were prepared using oligo-pyrazole >4 with these respective values of thickness: 20, 21, and 24 μm. The optical properties of the films, including the absorbance, transmittance, and optical band gap, were determined using UV-vis spectroscopy. The Eg values of the films were found to be 1.426, 1.537, and 1.648 eV for the 20, 21, and 24 μm thick organic films, respectively. Atomic force microscopy (AFM) was used to examine the surface morphology and properties of the organic films. In the AFM images, a few black regions were observed and several yellow regions appeared over a large area, and the surface of the oligo-pyrazole films had an extremely low roughness value. The as-synthesized oligo-pyrazole has great potential in optoelectronic applications according to the optical properties of the as-prepared films. Graphical abstract
机译:通过吡唑-3-羧酸> 1 的水解反应合成吡唑-3,4-二羧酸> 2 ,然后与亚硫酰氯加热,得到新型吡唑-3, 4-二羰基二氯化物> 3 ,在与对亚苯基二胺反应后很容易转化为低聚吡唑> 4 。这些新合成的化合物的特征在于 1 H-NMR, 13 C-NMR,FT-IR光谱和凝胶许可色谱(GPC)。使用oligo-pyrazole > 4 制备了三种新颖的oligo-pyrazole薄膜,它们的厚度分别为20、21和24μm。使用紫外-可见光谱法测定膜的光学性质,包括吸收率,透射率和光学带隙。对于20、21和24μm厚的有机膜,发现该膜的Eg值分别为1.426、1.537和1.648eV。原子力显微镜(AFM)用于检查有机膜的表面形态和性能。在AFM图像中,观察到一些黑色区域并且在大面积上出现一些黄色区域,并且该低聚吡唑膜的表面具有极低的粗糙度值。所合成的低聚吡唑根据所制备薄膜的光学性质在光电应用中具有巨大潜力。 <!-fig ft0-> <!-fig @ position =“ position” anchor“ == f4-> <!-fig mode =” anchred“ f5-> <!-fig / graphic | fig / alternatives / graphic mode =“ anchored” m1-> <!-caption a7->图形摘要

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