首页> 美国卫生研究院文献>Frontiers in Neuroscience >Revealing Spatial and Temporal Patterns of Cell Death, Glial Proliferation, and Blood-Brain Barrier Dysfunction Around Implanted Intracortical Neural Interfaces
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Revealing Spatial and Temporal Patterns of Cell Death, Glial Proliferation, and Blood-Brain Barrier Dysfunction Around Implanted Intracortical Neural Interfaces

机译:揭示皮质内神经界面周围细胞死亡,神经胶质增生和血脑屏障功能障碍的时空格局

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摘要

Improving the long-term performance of neural electrode interfaces requires overcoming severe biological reactions such as neuronal cell death, glial cell activation, and vascular damage in the presence of implanted intracortical devices. Past studies traditionally observe neurons, microglia, astrocytes, and blood-brain barrier (BBB) disruption around inserted microelectrode arrays. However, analysis of these factors alone yields poor correlation between tissue inflammation and device performance. Additionally, these studies often overlook significant biological responses that can occur during acute implantation injury. The current study employs additional histological markers that provide novel information about neglected tissue components—oligodendrocytes and their myelin structures, oligodendrocyte precursor cells, and BBB -associated pericytes—during the foreign body response to inserted devices at 1, 3, 7, and 28 days post-insertion. Our results reveal unique temporal and spatial patterns of neuronal and oligodendrocyte cell loss, axonal and myelin reorganization, glial cell reactivity, and pericyte deficiency both acutely and chronically around implanted devices. Furthermore, probing for immunohistochemical markers that highlight mechanisms of cell death or patterns of proliferation and differentiation have provided new insight into inflammatory tissue dynamics around implanted intracortical electrode arrays.
机译:改善神经电极接口的长期性能需要克服严重的生物反应,例如在植入皮质内装置的情况下神经元细胞死亡,神经胶质细胞活化和血管损伤。过去的研究传统上观察插入的微电极阵列周围的神经元,小胶质细胞,星形胶质细胞和血脑屏障(BBB)破坏。但是,仅对这些因素进行分析就会在组织炎症和设备性能之间产生不良关联。此外,这些研究通常忽略了在急性植入损伤期间可能发生的重要生物学反应。当前的研究采用了其他组织学标记物,这些物质在1、3、7、28天对插入设备的异物反应期间,提供了有关被忽视的组织成分的新信息,这些成分包括少突胶质细胞及其髓鞘结构,少突胶质细胞前体细胞和与BBB相关的周细胞。插入后。我们的研究结果揭示了植入装置周围急性和慢性的神经元和少突胶质细胞损失,轴突和髓鞘重组,神经胶质细胞反应性和周细胞缺乏的独特时空模式。此外,探索突出细胞死亡机制或增殖和分化模式的免疫组织化学标记物,为植入皮质内电极阵列周围的炎症组织动力学提供了新的见识。

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