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Chemical instability at chalcogenide surfaces impacts chalcopyrite devices well beyond the surface

机译:硫属化物表面的化学不稳定性会影响黄铜矿装置使其远远超出表面

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摘要

Portion of the In Se -Cu Se pseudobinary diagram showing the stable (solid lines) and metastable (dotted lines) phase equilibria (reproduced with permission from Gödecke et al. © Carl Hanser Verlag GmbH & Co.KG, München). The thin-film growth regions commonly referred to as Cu-poor and Cu-rich appear at the top as red and cyan fading portions, respectively. Magnification of the phase diagram in the region of interest for CIS processing (and extension to room temperature ) with hollow circles indicating the compositions investigated: CIS-P (red, Cu-poor), CIS-S (black, nearly stoichiometric) and CIS-R (cyan, Cu-rich). Insets: corresponding cross-sectional scanning electron microscopy images (CIS-R subject to KCN etching to remove the excess Cu Se phase). Schematic illustration of Cu-poor (top) and Cu-rich (bottom) films after growth (left) and cool down (right). In the Cu-poor case, In antisites are dispersed within the CIS lattice and part of them accumulate at grain boundaries during cool down, leading to Cu-poor grain boundaries (GB). Typical compositions of grain interiors at room-temperature match with the metastable Cu-poor region of existence, red patterned region in . Similarly, Cu antisites are dispersed within the CIS lattice of Cu-rich material, but Cu interstitials may also be present, possibly accounting for the enhanced grain growth during processing and for the existence of a supersaturated metastable phase at room temperature, cyan patterned region in . Photoluminescence spectra of CIS-P and CIS-R films acquired at 10 K. Whereas CIS-R shows excitonic emissions (labelled EX, indicative of high crystal quality) and up to three donor–acceptor pair transitions (labelled DA), CIS-P shows no excitonic emissions but broader, more red-shifted and more asymmetric defect-related transitions, typical of a high degree of compensation .
机译:In Se -Cu Se伪二元图的一部分,显示了稳定(实线)和亚稳(虚线)相平衡(经Gödecke等人复制,©Carl Hanser Verlag GmbH&Co.KG,慕尼黑)。通常称为贫铜和富铜的薄膜生长区域分别在顶部显示为红色和青色褪色部分。感兴趣的区域中进行CIS处理(并扩展至室温)的相图的放大倍数,带有空心圆,指示所研究的成分:CIS-P(红色,贫铜),CIS-S(黑色,接近化学计量)和CIS -R(青色,富含铜)。插图:相应的横截面扫描电子显微镜图像(经过KCN蚀刻以去除多余的Cu Se相的CIS-R)。生长(左)和冷却(右)后贫铜(上)和富铜(下)的示意图。在贫铜的情况下,In位点分散在CIS晶格中,并且一部分在冷却过程中聚集在晶界,从而导致贫铜的晶界(GB)。室温下谷物内部的典型组成与存在的亚稳态Cu贫乏区域(红色图案区域)匹配。同样,Cu反位点分散在富含Cu的材料的CIS晶格中,但也可能存在Cu间隙,这可能是由于加工过程中晶粒的生长增强以及室温下存在过饱和的亚稳态相而导致的。 。 CIS-P和CIS-R薄膜在10 K时的光致发光光谱。CIS-R显示出激子发射(标记为EX,表示高晶体质量)和最多三个供体-受体对跃迁(标记为DA),CIS-P显示没有激子发射,但具有更广泛,更红移且更不对称的与缺陷相关的过渡,这是高度补偿的典型特征。

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