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Metallization and Diffusion Bonding of CoSb3-Based Thermoelectric Materials

机译:基于CoSb3的热电材料的金属化和扩散键合

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摘要

CoSb -based skutterudite alloy is one of the most promising thermoelectric materials in the middle temperature range (room temperature—550 °C). However, the realization of an appropriate metallization layer directly on the sintered skutterudite pellet is indispensable for the real thermoelectric generation application. Here, we report an approach to prepare the metallization layer and the subsequent diffusion bonding method for the high-performance multi-filled -type skutterudite alloys. Using the electroplating followed by low-temperature annealing approaches, we successfully fabricated a Co-Mo metallization layer on the surface of the skutterudite alloy. The coefficient of thermal expansion of the electroplated layer was optimized by changing its chemical composition, which can be controlled by the electroplating temperature, current and the concentration of the Mo ions in the solution. We then joined the metallized skutterudite leg to the Cu-Mo electrode using a diffusion bonding method performed at 600 °C and 1 MPa for 10 min. The Co-Mo/skutterudite interfaces exhibit extremely low specific contact resistivity of 1.41 μΩ cm . The metallization layer inhibited the elemental inter-diffusion to less than 11 µm after annealing at 550 °C for 60 h, indicating a good thermal stability. The current results pave the way for the large-scale fabrication of CoSb -based thermoelectric modules.
机译:基于CoSb的方钴矿合金是中温范围(室温-550°C)中最有前途的热电材料之一。然而,对于实际的热电发电应用,直接在烧结方钴矿颗粒上实现合适的金属化层是必不可少的。在这里,我们报告了一种制备高性能多层填充方钴矿方合金的金属化层的方法和随后的扩散结合方法。通过电镀和低温退火方法,我们成功地在方钴矿合金表面上制造了Co-Mo金属化层。电镀层的热膨胀系数可通过改变其化学组成来优化,该化学组成可通过电镀温度,电流和溶液中Mo离子的浓度来控制。然后,我们使用扩散结合法在600°C和1 MPa下进行10分钟将金属化的方钴矿腿连接到Cu-Mo电极上。 Co-Mo /方钴矿界面显示出极低的1.41μlcm的比接触电阻率。在550°C退火60 h后,金属化层将元素相互扩散抑制到小于11 µm,表明具有良好的热稳定性。当前的结果为大规模制造基于CoSb的热电模块铺平了道路。

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