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Epitaxial graphene homogeneity and quantum Hall effect in millimeter-scale devices

机译:毫米级器件中的外延石墨烯均匀性和量子霍尔效应

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摘要

Quantized magnetotransport is observed in 5.6 × 5.6 mm2 epitaxial graphene devices, grown using highly constrained sublimation on the Si-face of SiC(0001) at high temperature (1900 °C). The precise quantized Hall resistance of Rxy=h2e2 is maintained up to record level of critical current Ixx = 0.72 mA at T = 3.1 K and 9 T in a device where Raman microscopy reveals low and homogeneous strain. Adsorption-induced molecular doping in a second device reduced the carrier concentration close to the Dirac point (n ≈ 1010 cm−2), where mobility of 18760 cm2/V is measured over an area of 10 mm2. Atomic force, confocal optical, and Raman microscopies are used to characterize the large-scale devices, and reveal improved SiC terrace topography and the structure of the graphene layer. Our results show that the structural uniformity of epitaxial graphene produced by face-to-graphite processing contributes to millimeter-scale transport homogeneity, and will prove useful for scientific and commercial applications.
机译:在5.6×5.6 mm 2 外延石墨烯器件中观察到了量化的磁传输,该器件是在高温(1900°C)下通过高度约束升华在SiC(0001)的Si面上生长的。 R 的精确量化霍尔电阻> xy = h 2 e 2 保持到T = 3.1时的临界电流Ixx = 0.72 mA的记录水平装置中的K和9 T,拉曼显微镜显示低而均匀的应变。在第二种设备中,吸附诱导的分子掺杂降低了载流子浓度,使其接近Dirac点(n≈10 10 cm -2 ),其中迁移率为18760 cm 在10 mm 2 的面积上测量2 / V。原子力,共焦光学和拉曼显微镜用于表征大型器件,并显示出改进的SiC台面形貌和石墨烯层的结构。我们的结果表明,通过面对石墨加工所产生的外延石墨烯的结构均匀性有助于实现毫米级的运输均匀性,并将被证明对科学和商业应用有用。

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