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Prepare dispersed CIS nano-scale particles and spray coating CIS absorber layers using nano-scale precursors

机译:准备分散的CIS纳米级颗粒并使用纳米级前体喷涂CIS吸收层

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摘要

In this study, the Mo-electrode thin films were deposited by a two-stepped process, and the high-purity copper indium selenide-based powder (CuInSe2, CIS) was fabricated by hydrothermal process by Nanowin Technology Co. Ltd. From the X-ray pattern of the CIS precursor, the mainly crystalline phase was CIS, and the almost undetectable CuSe phase was observed. Because the CIS powder was aggregated into micro-scale particles and the average particle sizes were approximately 3 to 8 μm, the CIS power was ground into nano-scale particles, then the 6 wt.% CIS particles were dispersed into isopropyl alcohol to get the solution for spray coating method. Then, 0.1 ml CIS solution was sprayed on the 20 mm × 10 mm Mo/glass substrates, and the heat treatment for the nano-scale CIS solution under various parameters was carried out in a selenization furnace. The annealing temperature was set at 550°C, and the annealing time was changed from 5 to 30 min, without extra Se content was added in the furnace. The influences of annealing time on the densification, crystallization, resistivity (ρ), hall mobility (μ), and carrier concentration of the CIS absorber layers were well investigated in this study.
机译:在这项研究中,通过两步工艺沉积了Mo电极薄膜,并由Nanowin Technology Co. Ltd.通过水热工艺制备了高纯度铜铟硒化物基粉末(CuInSe2,CIS)。 CIS前体的X射线图,主要结晶相为CIS,观察到几乎无法检测到的CuSe相。由于CIS粉末聚集为微米级颗粒,平均粒径约为3至8μm,因此将CIS粉末研磨成纳米级颗粒,然后将6 wt。%CIS颗粒分散在异丙醇中以得到喷涂方法的解决方案。然后,将0.1 ml CIS溶液喷涂在20 mm××10 mm Mo /玻璃基板上,并在硒化炉中对各种参数的纳米级CIS溶液进行热处理。将退火温度设置为550°C,并将退火时间从5分钟更改为30分钟,而无需在炉中添加额外的硒含量。本研究充分研究了退火时间对CIS吸收层的致密化,结晶,电阻率(ρ),霍尔迁移率(μ)和载流子浓度的影响。

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