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A silicon-on-insulator polarization diversity scheme in the mid-infrared

机译:中红外的绝缘体上硅极化分集方案

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摘要

We propose a silicon-on-insulator (SOI) polarization diversity scheme in the mid-infrared wavelength range. In consideration of absorption loss in silicon dioxide (SiO2), the polarization splitter-rotator (PSR) is designed and optimized with silicon nitride (SiN) upper-cladding and SiO2 lower-cladding. This asymmetry allows the PSR, which consists of mode-conversion tapers and subsequent mode-sorting asymmetric Y-junctions, to be fabricated with a simple one-step etching process. Simulation shows that our PSR has good performance with low mode conversion loss (< 0.25 dB) and low crosstalk (< –18 dB) in a very large wavelength range from 4.0 μm to 4.4 μm. The PSR also exhibits large fabrication tolerance with respect to the size deviations in waveguide width, height and refractive index of the upper-cladding. Additionally, PSR devices based on Y-junctions with SiO2 upper-cladding, and SiN upper- and lower-claddings are designed for potential applications at shorter and longer wavelengths, respectively. These PSR devices could facilitate the development of silicon photonic devices in the mid-infrared.
机译:我们提出了一种在中红外波长范围内的绝缘体上硅(SOI)极化分集方案。考虑到二氧化硅(SiO2)的吸收损耗,设计了偏振分束旋转器(PSR),并使用氮化硅(SiN)上覆层和SiO2下覆层进行了优化。这种不对称性使得可以通过简单的一步蚀刻工艺来制造由模式转换锥度和随后的模式分类不对称Y结组成的PSR。仿真表明,在4.0μm至4.4μm的很大波长范围内,我们的PSR具有良好的性能,具有低模式转换损耗(<0.25 dB)和低串扰(<–18 dB)。对于上覆层的波导宽度,高度和折射率的尺寸偏差,PSR还表现出较大的制造公差。此外,基于Y结的SiO2上覆层,SiN上覆层和下覆层的PSR器件分别设计用于较短波长和较长波长的潜在应用。这些PSR器件可以促进中红外硅光子器件的开发。

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