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Unconventional Transport through Graphene on SrTiO3: A Plausible Effect of SrTiO3 Phase-Transitions

机译:通过石墨烯在SrTiO3上的非常规传输:SrTiO3相变的合理影响

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摘要

High-k dielectric oxides are supposedly ideal gate-materials for ultra-high doping in graphene and other 2D-crystals. Here, we report a temperature-dependent electronic transport study on chemical vapor deposited-graphene gated with SrTiO3 (STO) thin film substrate. At carrier densities away from charge neutrality point the temperature-dependent resistivity of our graphene samples on both STO and SiO2/Si substrates show metallic behavior with contributions from Coulomb scattering and flexural phonons attributable to the presence of characteristic quasi-periodic nano-ripple arrays. Significantly, for graphene samples on STO substrates we observe an anomalous ‘slope-break' in the temperature-dependent resistivity for T = 50 to 100 K accompanied by a decrease in mobility above 30 K. Furthermore, we observe an unusual decrease in the gate-induced doping-rate at low temperatures, despite an increase in dielectric constant of the substrate. We believe that a complex mechanism is at play as a consequence of the structural phase transition of the underlying substrate showing an anomalous transport behavior in graphene on STO. The anomalies are discussed in the context of Coulomb as well as phonon scattering.
机译:高k介电氧化物被认为是石墨烯和其他2D晶体中超高掺杂的理想栅极材料。在这里,我们报告了与SrTiO3(STO)薄膜衬底门控的化学气相沉积石墨烯的温度依赖性电子传输研究。在载流子密度远离电荷中性点的情况下,我们的石墨烯样品在STO和SiO2 / Si衬底上的温度相关电阻率显示出金属行为,归因于存在库仑散射和弯曲声子,这归因于特征准准纳米波纹阵列的存在。值得注意的是,对于STO基板上的石墨烯样品,我们观察到T = 50至100 K时,温度相关电阻率出现异常的“斜率折断”,伴随着迁移率在30 K以上时降低,此外,我们观察到栅极的异常降低。尽管增加了衬底的介电常数,但在低温下仍会产生高的掺杂速率。我们认为,由于底层衬底的结构相变显示STO上的石墨烯具有异常的传输行为,因此复杂的机制正在发挥作用。在库仑以及声子散射的背景下讨论了这些异常。

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