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Tunnelling current-voltage characteristics of Angstrom gaps measured with terahertz time-domain spectroscopy

机译:太赫兹时域光谱法测量的埃氏间隙隧穿电流-电压特性

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摘要

Quantum tunnelling becomes inevitable as gap dimensions in metal structures approach the atomic length scale, and light passing through these gaps can be used to examine the quantum processes at optical frequencies. Here, we report on the measurement of the tunnelling current through a 3-Å-wide metal-graphene-metal gap using terahertz time-domain spectroscopy. By analysing the waveforms of the incident and transmitted terahertz pulses, we obtain the tunnelling resistivity and the time evolution of the induced current and electric fields in the gap and show that the ratio of the applied voltage to the tunnelling current is constant, i.e., the gap shows ohmic behaviour for the strength of the incident electric field up to 30 kV/cm. We further show that our method can be extended and applied to different types of nanogap tunnel junctions using suitable equivalent RLC circuits for the corresponding structures by taking an array of ring-shaped nanoslots as an example.
机译:随着金属结构中间隙尺寸接近原子长度尺度,量子隧穿变得不可避免,并且穿过这些间隙的光可用于检查光频率下的量子过程。在这里,我们报告了使用太赫兹时域光谱仪测量通过3-Å宽的金属-石墨烯-金属间隙的隧穿电流的情况。通过分析入射和传输的太赫兹脉冲的波形,我们可以得出隧穿电阻率以及间隙中感应电流和电场的时间演化,并表明施加电压与隧穿电流之比是恒定的,即间隙显示了在高达30 kV / cm的入射电场强度下的欧姆行为。我们进一步证明,我们可以通过以环形纳米缝隙阵列为例,使用适用于相应结构的等效RLC电路,将我们的方法扩展并应用于不同类型的纳米间隙隧道结。

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