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Topological nature and the multiple Dirac cones hidden in Bismuth high-Tc superconductors

机译:铋高Tc超导体中隐藏的拓扑性质和多个Dirac锥

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摘要

Recent theoretical studies employing density-functional theory have predicted BaBiO3 (when doped with electrons) and YBiO3 to become a topological insulator (TI) with a large topological gap (~0.7 eV). This, together with the natural stability against surface oxidation, makes the Bismuth-Oxide family of special interest for possible applications in quantum information and spintronics. The central question, we study here, is whether the hole-doped Bismuth Oxides, i.e. Ba1-xKxBiO3 and BaPb1-xBixO3, which are “high-Tc” bulk superconducting near 30 K, additionally display in the further vicinity of their Fermi energy EF a topological gap with a Dirac-type of topological surface state. Our electronic structure calculations predict the K-doped family to emerge as a TI, with a topological gap above EF. Thus, these compounds can become superconductors with hole-doping and potential TIs with additional electron doping. Furthermore, we predict the Bismuth-Oxide family to contain an additional Dirac cone below EF for further hole doping, which manifests these systems to be candidates for both electron- and hole-doped topological insulators.
机译:最近使用密度泛函理论的理论研究已经预测BaBiO3(掺杂电子时)和YBiO3会成为具有大拓扑间隙(〜0.7 eV)的拓扑绝缘体(TI)。这加上抗表面氧化的天然稳定性,使得氧化铋系列特别适合可能在量子信息和自旋电子学中的应用。我们在这里研究的中心问题是,是否有空穴掺杂的氧化铋,即Ba1-xKxBiO3和BaPb1-xBixO3,它们是在30 nearK附近“高Tc”的块状超导,是否还在费米能量EF附近显示?具有狄拉克型拓扑表面状态的拓扑间隙。我们的电子结构计算预测,掺杂K的族将以TI的形式出现,其拓扑间隙高于EF。因此,这些化合物可以成为具有空穴掺杂的超导体和具有额外电子掺杂的电势TI。此外,我们预测铋氧化物系列将在EF以下包含一个额外的Dirac锥,用于进一步的空穴掺杂,这表明这些系统既是电子掺杂空穴掺杂拓扑绝缘体的候选者。

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