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Distinguishing physical mechanisms using GISAXS experiments and linear theory: the importance of high wavenumbers

机译:使用GISAXS实验和线性理论区分物理机制:高波数的重要性

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摘要

In this work we analyze GISAXS measurements of the structure factor of Si surfaces evolving during 1 keV Ar+ ion bombardment. Using newly-developed methods sensitive to the full range of experimentally-available wavenumbers q, we extract the linear amplification rate R(q) governing surface stability over a range of wavenumbers 4–5 times larger than has previously been obtained. Comparing with theoretical models also retaining full wavenumber-dependence, we find an excellent fit of the experimental data over the full range of irradiation angles and wavenumbers. Moreover, the fitted parameter values represent experimental evaluation of the magnitudes of most physical mechanisms currently believed to be important to the pattern-formation process. In all cases, the extracted values agree well with direct observations or atomistic simulations of the same quantities, suggesting that GISAXS analysis may allow more powerful comparison between experiment and theory than had previously been thought.
机译:在这项工作中,我们分析了在1 keV Ar +离子轰击过程中演变的Si表面结构因子的GISAXS测量。使用对整个实验可用波数q都敏感的新开发方法,我们提取了控制波数范围比以前获得的波数大4-5倍的表面稳定性的线性放大率R(q)。与还保留了完全波数相关性的理论模型相比,我们发现在整个照射角度和波数范围内,实验数据都非常合适。此外,拟合的参数值表示对目前认为对图案形成过程很重要的大多数物理机制的大小的实验评估。在所有情况下,提取的值都与直接观察或相同数量的原子模拟非常吻合,这表明GISAXS分析可以比以前认为的进行更强大的实验和理论比较。

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