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Efficient high-order suppression system for a metrology beamline

机译:计量光束线的高效高阶抑制系统

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摘要

High-quality metrology with synchrotron radiation requires in particular a very high spectral purity of the incident beam. This is usually achieved by a set of transmission filters with suitable absorption edges to suppress high-order radiation of the monochromator. The at-wavelength metrology station at a BESSY-II bending-magnet collimated plane-grating monochromator (c-PGM) beamline has recently commissioned a high-order suppression system (HiOS) based on four reflections from mirrors which can be inserted into the beam path. Two pairs of mirrors are aligned parallel so as not to disturb the original beam path and are rotated clockwise and counter-clockwise. Three sets of coatings are available for the different energy ranges and the incidence angle is freely tunable to find the optimum figure of merit for maximum suppression at maximum transmission for each photon energy required. Measured performance results of the HiOS for the EUV and XUV range are compared with simulations, and applications are discussed.
机译:具有同步加速器辐射的高质量计量尤其需要入射光束的非常高的光谱纯度。通常,这是通过一组具有合适吸收边的透射滤光片来实现的,以抑制单色仪的高阶辐射。 BESSY-II弯曲磁铁准直平面光栅单色仪(c-PGM)光束线的波长计量站最近基于可插入光束的反射镜的四次反射启用了高阶抑制系统(HiOS)。路径。两对反射镜平行排列,以免干扰原始光束路径,并顺时针和逆时针旋转。三套涂层可用于不同的能量范围,并且入射角可自由调节以找到最佳的品质因数,以针对所需的每个光子能量在最大透射率时获得最大抑制。将HiOS在EUV和XUV范围内测得的性能结果与仿真进行了比较,并讨论了其应用。

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