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Forward-Masking Patterns Produced by Symmetric and Asymmetric Pulse Shapes in Electric Hearing

机译:电听力中对称和不对称脉冲形状产生的前向屏蔽模式

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摘要

Two forward-masking experiments were conducted with six cochlear implant listeners to test whether asymmetric pulse shapes would improve the place-specificity of stimulation compared to symmetric ones. The maskers were either cathodic-first symmetric biphasic, pseudomonophasic (i.e. with a second anodic phase longer and lower in amplitude than the first phase), or “delayed pseudomonophasic” (identical to pseudomonophasic but with an inter-phase gap) stimuli. In Experiment 1, forward-masking patterns for monopolar maskers were obtained by keeping each masker fixed on a middle electrode of the array and measuring the masked thresholds of a monopolar signal presented on several other electrodes. The results were very variable and no difference between pulse shapes was found. In Experiment 2, six maskers were used in a wide bipolar (BP + 9) configuration: the same three pulse shapes as in Experiment 1, either cathodic-first relative to the most apical or relative to the most basal electrode of the bipolar channel. The pseudomonophasic masker showed a stronger excitation proximal to the electrode of the bipolar pair for which the short, high-amplitude phase was anodic. However, no difference was obtained with the symmetric and, more surprisingly, with the delayed pseudomonophasic maskers. Implications for cochlear implant design are discussed.
机译:对六个耳蜗植入听众进行了两个前向掩蔽实验,以测试与对称的相比,非对称的脉冲形状是否会改善刺激的位置特异性。掩蔽物是阴极第一对称双相,伪单相(即,第二阳极相的振幅比第一相长且振幅低)或“延迟的伪单相”(与伪单相相同,但具有相间间隙)的刺激。在实验1中,通过将每个掩膜器固定在阵列的中间电极上,并测量出现在其他几个电极上的单极信号的掩膜阈值,可以获得单极掩膜器的正向掩膜图案。结果变化很大,没有发现脉冲形状之间的差异。在实验2中,在宽双极(BP + 9)配置中使用了六个掩膜:与实验1相同的三个脉冲形状,相对于双极通道的最顶端电极而言是阴极优先,或者相对于最基极电极而言是阴极优先。伪单相掩膜器在短高振幅相为阳极的双极对电极附近显示出更强的激发。然而,对称的,以及更令人惊讶的是,延迟的伪单相掩蔽器没有获得任何区别。讨论对人工耳蜗设计的影响。

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