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Magnetic Properties of FeNi-Based Thin Film Materials with Different Additives

机译:不同添加剂的FeNi基薄膜材料的磁性能

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摘要

This paper presents a study of FeNi-based thin film materials deposited with Mo, Al and B using a co-sputtering process. The existence of soft magnetic properties in combination with strong magneto-mechanical coupling makes these materials attractive for sensor applications. Our findings show that FeNi deposited with Mo or Al yields magnetically soft materials and that depositing with B further increases the softness. The out-of-plane magnetic anisotropy of FeNi thin films is reduced by depositing with Al and completely removed by depositing with B. The effect of depositing with Mo is dependent on the Mo concentration. The coercivity of FeNiMo and FeNiAl is reduced to less than a half of that of FeNi, and a value as low as 40 A/m is obtained for FeNiB. The surfaces of the obtained FeNiMo, FeNiAl and FeNiB thin films reveal very different morphologies. The surface of FeNiMo shows nano-cracks, while the FeNiAl films show large clusters and fewer nano-cracks. When FeNi is deposited with B, a very smooth morphology is obtained. The crystal structure of FeNiMo strongly depends on the depositant concentration and changes into an amorphous structure at a higher Mo level. FeNiAl thin films remain polycrystalline, even at a very high concentration of Al, and FeNiB films are amorphous, even at a very low concentration of B.
机译:本文介绍了使用共溅射工艺沉积以Mo,Al和B沉积的FeNi基薄膜材料的研究。软磁性能与强大的磁机械耦合的结合使这些材料对传感器应用具有吸引力。我们的发现表明,沉积有Mo或Al的FeNi会产生软磁性材料,而沉积有B的FeNi会进一步增加软度。 FeAl薄膜的平面外磁各向异性通过Al的沉积得以降低,而通过B的沉积得以完全去除。Mo的沉积效果取决于Mo的浓度。 FeNiMo和FeNiAl的矫顽力降低到不到FeNi的一半,FeNiB的矫顽力低至40 A / m。所获得的FeNiMo,FeNiAl和FeNiB薄膜的表面显示出非常不同的形态。 FeNiMo的表面显示出纳米裂纹,而FeNiAl膜显示出大簇且纳米裂纹更少。当FeNi与B一起沉积时,获得非常光滑的形态。 FeNiMo的晶体结构在很大程度上取决于沉积物的浓度,并在较高的Mo水平下转变为非晶结构。即使在非常高的Al浓度下,FeNiAl薄膜仍保持多晶态,即使在非常低的B浓度下,FeNiB薄膜仍是非晶态的。

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