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Electrodeposition of amorphous molybdenum sulfide thin film for electrochemical hydrogen evolution reaction

机译:用于电化学析氢反应的非晶态硫化钼薄膜的电沉积

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摘要

Amorphous molybdenum sulfide (MoSx) is a highly active noble-metal-free electrocatalysts for the hydrogen evolution reaction (HER). The MoSx was prepared by electrochemical deposition at room temperature. Low-cost precursors of Mo and S were adopted to synthesize thiomolybdates solution as the electrolyte. It replaces the expensive (NH)2MoS4 and avoid the poison gas (H2S) to generate or employ. The (MoO2S2)2−, (MoOS3)2− and (MoS4)2− ions were determined by UV–VIS spectroscopy. The electrodeposition of MoSx was confirmed with XRD, XPS and SEM. The electrocatalyst activity was measured by polarization curve. The electrolyte contained (MoO2S2)2− ion and (MoOS3)2− ion electrodeposit the MoSx thin film displays a relatively high activity for HER with low overpotential of 211 mV at a current density of 10 mA cm−2, a relatively high current density of 21.03 mA cm−2 at η = 250 mV, a small Tafel slope of 55 mV dec−1. The added sodium dodecyl sulfate (SDS) can efficient improve the stability of the MoSx film catalyst.Electronic supplementary materialThe online version of this article (10.1186/s13065-019-0600-0) contains supplementary material, which is available to authorized users.
机译:非晶态硫化钼(MoSx)是用于氢释放反应(HER)的高活性无贵金属电催化剂。 MoSx通过在室温下进行电化学沉积制备。采用低成本的Mo和S前驱体来合成硫代钼酸盐溶液作为电解质。它替代了昂贵的(NH)2MoS4,避免了有毒气体(H2S)的产生或使用。 (MoO2S2) 2-,(MoOS3) 2-和(MoS4) 2-离子是通过UV-VIS光谱法测定的。用XRD,XPS和SEM证实MoSx的电沉积。通过极化曲线测量电催化剂活性。电沉积MoSx薄膜的(MoO2S2) 2-离子和(MoOS3) 2-离子的电解质对HER显示较高的HER活性,在200℃和211毫伏的低过电位。电流密度为10 mA cm −2 ,相对较高的电流密度为η= 250 mV时为21.03 mA cm −2 ,Tafel斜率较小,为55 mV dec −1 。添加的十二烷基硫酸钠(SDS)可以有效地提高MoSx膜催化剂的稳定性。电子辅助材料本文的在线版本(10.1186 / s13065-019-0600-0)包含辅助材料,授权用户可以使用。

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