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Ligand-induced reduction concerted with coating by atomic layer deposition on the example of TiO2-coated magnetite nanoparticles

机译:配体诱导的还原与原子层沉积涂层相伴而生-以TiO2包覆的磁铁矿纳米颗粒为例

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摘要

Atomic layer deposition is a chemical deposition technology that provides ultimate control over the conformality of films and their thickness, even down to Ångström-scale precision. Based on the marked superficial character and gas phase process of the technique, metal sources and their ligands shall ideally be highly volatile. However, in numerous cases those ligands corrode the substrate or compete for adsorption sites, well-known as side reactions of these processes. Therefore, the ability to control such side reactions might be of great interest, since it could achieve synchronous coating and alteration of a substrate in one process, saving time and energy otherwise needed for a post-treatment of the sample. Consequently, advances in this way must require understanding and control of the chemical processes that occur during the coating. In this work, we show how choosing an appropriate ligand of the metal source can unveil a novel approach to concertedly coat and reduce γ-Fe2O3 nanoparticles to form a final product composed of Fe3O4/TiO2 core/shell nanoparticles. To this aim, we envisage that appropriate design of precursors and selection of substrates will pave the way for numerous new compositions, while the ALD process itself allows for easy upscaling to large amounts of coated and reduced particles for industrial use.
机译:原子层沉积是一种化学沉积技术,可以对薄膜的保形性及其厚度进行最终控制,甚至可以降低到Ångström规模的精度。基于该技术的明显表面特征和气相过程,理想地,金属源及其配体应具有高挥发性。但是,在许多情况下,这些配体会腐蚀底物或竞争吸附位点,这是众所周知的这些过程的副反应。因此,控制这种副反应的能力可能引起人们极大的兴趣,因为它可以在一个过程中实现涂层的同步涂覆和更换,从而节省了时间和能量,而这些时间和能量是样品后处理所需要的。因此,以这种方式进行的改进必须要求理解和控制在涂覆过程中发生的化学过程。在这项工作中,我们展示了如何选择合适的金属源配体可以揭示一种新颖的方法,以一致地涂覆和还原γ-Fe2O3纳米颗粒,从而形成由Fe3O4 / TiO2核/壳纳米颗粒组成的最终产品。为此,我们设想适当的前体设计和基材的选择将为众多新的组合物铺平道路,而ALD工艺本身则可以轻松地扩大规模以用于工业用途的大量涂覆和减少的颗粒。

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