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Fabrication of Low Temperature Carbon Nanotube Vertical Interconnects Compatible with Semiconductor Technology

机译:兼容半导体技术的低温碳纳米管垂直互连件的制造

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摘要

We demonstrate a method for the low temperature growth (350 °C) of vertically-aligned carbon nanotubes (CNT) bundles on electrically conductive thin-films. Due to the low growth temperature, the process allows integration with modern low-κ dielectrics and some flexible substrates. The process is compatible with standard semiconductor fabrication, and a method for the fabrication of electrical 4-point probe test structures for vertical interconnect test structures is presented. Using scanning electron microscopy the morphology of the CNT bundles is investigated, which demonstrates vertical alignment of the CNT and can be used to tune the CNT growth time. With Raman spectroscopy the crystallinity of the CNT is investigated. It was found that the CNT have many defects, due to the low growth temperature. The electrical current-voltage measurements of the test vertical interconnects displays a linear response, indicating good ohmic contact was achieved between the CNT bundle and the top and bottom metal electrodes. The obtained resistivities of the CNT bundle are among the average values in the literature, while a record-low CNT growth temperature was used.
机译:我们演示了一种在导电薄膜上垂直排列的碳纳米管(CNT)束低温生长(350°C)的方法。由于生长温度低,该工艺可以与现代低κ电介质和某些柔性基板集成。该工艺与标准半导体制造兼容,并且提出了一种用于垂直互连测试结构的电学四点探针测试结构的制造方法。使用扫描电子显微镜研究了碳纳米管束的形态,这表明碳纳米管的垂直排列,可用于调整碳纳米管的生长时间。用拉曼光谱法研究了CNT的结晶度。已经发现由于生长温度低,CNT具有许多缺陷。测试垂直互连的电流-电压测量显示线性响应,表明CNT束与顶部和底部金属电极之间实现了良好的欧姆接触。所获得的CNT束的电阻率在文献中处于平均值之中,而使用了创纪录的CNT生长温度。

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